LCD Column Spacer and Light Blocking Member Formation
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Solution Overview
Problem
In liquid crystal display manufacturing, the simultaneous formation of spacers and light blocking members can lead to reflow issues during the spacer manufacturing process, resulting in poor process margins and compromised compression characteristics, which affect the uniformity of the cell gap and display quality.
Innovation Solution
A method involving the use of a mask with specific regions for forming a light blocking member and column spacer, where the photoresist is exposed using a single mask, ensuring uniform energy exposure and preventing reflow, thereby improving process margins and maintaining the cell gap uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If spacers and light blocking members are simultaneously formed to simplify the process, then manufacturing complexity is reduced, but reflow is generated in the post-hardening process which deteriorates spacer taper and compression characteristics
Solution Approach 1:
The mask is divided into three distinct regions: a first region that passes light, a second region with a blocking filter layer that selectively passes light, and a third region that blocks light. This segmentation allows different portions of the photoresist to receive different amounts of light energy, enabling the formation of both spacers and light blocking members with appropriate structural integrity without reflow issues.
Solution Approach 2:
Different regions of the mask provide different light transmission properties tailored to the specific requirements of each structure being formed. The blocking filter layer in the second region selectively passes certain wavelengths while blocking others, creating localized variations in exposure that prevent reflow in critical areas while still allowing simultaneous formation of multiple structures.
2Manufacturing precision
If a blocking filter layer is added to the mask to prevent reflow, then spacer compression characteristics are improved, but mask complexity increases
Solution Approach 1:
The blocking filter layer acts as an intermediary element in the mask structure that mediates between the need for light transmission to form structures and the need to prevent reflow. By selectively blocking certain wavelengths while passing others, it provides a nuanced control mechanism that achieves precise structural formation without requiring completely opaque or fully transparent regions.
Solution Approach 2:
The mask design utilizes changes in optical parameters (wavelength selectivity) through the blocking filter layer to achieve different exposure outcomes in different regions. This allows the same mask structure to produce varied effects - full exposure in the first region, selective exposure in the second region, and no exposure in the third region - thereby controlling reflow while maintaining structural integrity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the simultaneous formation of light blocking members and column spacers as a single, unitary member, preventing reflow and enhancing manufacturing efficiency while maintaining the cell gap integrity, thus improving display quality and process stability.
Implementation Method 1
exposing the photoresist by using the mask
Data Source
AI summary
A manufacturing method of a liquid crystal display includes: forming a thin film transistor on a first substrate; forming a color filter on the thin film transistor; forming a pixel electrode on the color filter; and forming a light blocking member including a column spacer protruded from the light blocking member on the color filter. The forming the light blocking member uses a mask including a first region, a second region, and a third region. The first region passes light generated from a light exposer, the second region includes a blocking filter layer which selectively passes the light generated from the light exposer, and the third region blocks the light generated from the light exposer.