LDMOS Ring Field Plate for On-Resistance and Breakdown Voltage
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Solution Overview
Problem
Current semiconductor devices face challenges in achieving low on-resistance while maintaining high breakdown voltage, which is essential for high-voltage applications and energy efficiency.
Innovation Solution
A lateral diffused MOS transistor (LDMOS) is designed with a ring-shaped field plate that surrounds the source and drain regions, comprising a conductive layer with a dielectric layer under portions of the field plate to smooth the electrical field and reduce breakdown voltage, thereby achieving low on-resistance and high breakdown voltage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional LDMOS structure is used, then high breakdown voltage is achieved, but on-resistance remains high
Solution Approach 1:
The field plate structure is segmented into a conventional linear portion and an added ring-shaped portion, allowing different regions to serve different functions: the linear portion maintains high breakdown voltage while the ring portion reduces on-resistance by smoothing the electrical field in the drift region
Solution Approach 2:
The ring-shaped field plate is positioned to surround the source and drain regions, creating localized field smoothing in specific areas of the drift region where it most effectively reduces on-resistance, while maintaining high breakdown voltage in other regions
2Loss of energy
If the electrical field in the drift region is smoothed to reduce on-resistance, then energy loss decreases, but breakdown voltage may be compromised
Solution Approach 1:
The field plate is divided into functional segments: the ring-shaped portion smooths the electrical field to reduce on-resistance, while the linear portion extending from the gate maintains the high breakdown voltage characteristic, allowing both objectives to be achieved simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The LDMOS device exhibits reduced energy consumption and increased design tolerance due to its low on-resistance characteristics and ability to withstand sufficient high breakdown voltage, making it suitable for high-voltage applications.
Implementation Method 1
A first portion of the ring-shaped field plate on an isolation can make a drift region of the LDMOS more smooth to reduce or suspend break down
Implementation Method 2
Due to having a dielectric layer under a second portion of a ring-shaped field plate neighboring a gate structure, the LDMOS can be applied with sufficient high break-down voltage
Data Source
AI summary
A lateral diffused semiconductor device is disclosed, including: a substrate; a first isolation and a second isolation comprising at least portions disposed in the substrate to define an active area; a first drift region and a second drift region disposed in the active area, wherein the first drift region is disposed in the second drift region; a gate structure on the substrate; a source region in the first drift region; a drain region in the second drift region; and a ring-shaped field plate on the substrate, wherein the ring-shaped field plate surrounds at least one of the source and the drain region.


