LED Photoluminescent Block Formation With Transparent Alignment Layers
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Solution Overview
Problem
The manufacturing of optoelectronic devices with light-emitting diodes and photoluminescent blocks faces challenges due to the partial opacity of photoluminescent layers to visible light, making photolithography alignment difficult, and the need for materials suitable for photolithography steps, while also aiming for high aspect ratio photoluminescent blocks and cost-effective industrial-scale production.
Innovation Solution
A method involving the formation of layers covering light-emitting diodes, delimiting openings, filling with photoluminescent materials, and chemical-mechanical polishing to create photoluminescent blocks, with some layers being transparent to emitted radiation and using reflective coatings and barrier layers to enhance the process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If photolithography methods are used to delimit photoluminescent blocks, then alignment precision can be achieved, but the process becomes difficult to implement because the photoluminescent layer is partially opaque to visible light
Solution Approach 1:
The patent introduces an intermediary transparent layer deposited over the photoluminescent layer. This intermediate layer is transparent to visible light, allowing alignment marks to be detected during photolithography while protecting the underlying photoluminescent structure. The intermediary layer acts as a mediator that enables the photolithography process to proceed effectively despite the opacity of the photoluminescent material.
2Adaptability or versatility
If photoluminescent materials are used that are not photosensitive, then material versatility is improved, but photolithography alignment becomes difficult
Solution Approach 1:
The patent segments the structure into distinct functional layers: the photoluminescent layer (which may not be photosensitive) and a separate transparent intermediary layer. This segmentation allows the photoluminescent material to maintain its desired properties while the transparent layer provides the optical functionality needed for alignment during photolithography.
3Manufacturing precision
If chemical-mechanical polishing is performed to delimit photoluminescent blocks, then manufacturing precision is improved, but the process complexity increases
Solution Approach 1:
The patent applies chemical-mechanical polishing to the transparent intermediary layer before depositing the photoluminescent material. This preliminary action creates a precisely defined planar surface and delimits the areas where photoluminescent blocks will form, ensuring high manufacturing precision while simplifying subsequent processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the efficient formation of optoelectronic devices with high aspect ratio photoluminescent blocks, overcoming alignment issues and enabling industrial-scale, cost-effective production while ensuring transparency to emitted radiation.
Implementation Method 1
performing a chemical-mechanical polishing to delimit the first blocks
Implementation Method 2
forming walls with reflective sides in the fourth openings
Data Source
AI summary
A method of manufacturing an optoelectronic device including assemblies of light-emitting diodes (LED) having first and second assemblies and first blocks made of a first photoluminescent material, each covering one of the first assemblies. The method includes the forming of a layer covering the first and second assemblies, the delimiting of first openings in the layer to expose the first assemblies, the filling of the first openings with the first material, and the performing of a chemical-mechanical polishing to delimit the first blocks.