LED with Non-Uniform P-Type Resistance for Carrier Distribution

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Solution Overview

Problem

Conventional light emitting diodes (LEDs) suffer from insufficient light intensity due to inefficient carrier injection, where holes primarily inject under the electrode, limiting the light-emitting area and overall efficiency.

Innovation Solution

The LED design incorporates a second-type semiconductor layer with regions of different resistances and dopant distribution densities, along with a rough surface formed through ion implantation, allowing carriers to inject and combine more effectively across the light-emitting layer, enhancing light intensity and reducing total reflection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the area of the electrode above the P-type semiconductor layer is enlarged to allow carrier injection into more portions of the light emitting layer, then the carrier injection efficiency is improved, but the light emitting area is decreased due to the opaque material of the electrode

Engineering Contradiction:
Improvecarrier injection efficiencyVSAvoidlight emitting area
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The patent applies local quality by creating regions with different resistance values within the P-type semiconductor layer. Specifically, a first region under the electrode has higher resistance while a second region has lower resistance. This non-uniform resistance distribution allows carriers to be effectively injected and distributed across different areas of the light emitting layer, resolving the contradiction between injection efficiency and light emitting area.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the resistance parameter of the P-type semiconductor layer by introducing dopants with different distribution densities in different regions. The dopant concentration is adjusted to create the desired resistance profile, where the first region has higher resistance and the second region has lower resistance, enabling improved carrier distribution without sacrificing light emitting area.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If dopants are introduced to create different resistance regions in the P-type semiconductor layer, then carrier distribution is improved, but the device complexity increases

Engineering Contradiction:
Improvecarrier distribution efficiencyVSAvoiddoping process complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent segments the P-type semiconductor layer into distinct regions with different resistance characteristics. The layer is divided into a first region under the electrode with higher resistance and a second region with lower resistance. This segmentation is achieved through controlled dopant distribution, allowing independent optimization of carrier injection and distribution without requiring entirely new device structures.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach increases light-emitting intensity and efficiency by ensuring carriers combine throughout the light-emitting layer, rather than just under the electrode, and decreases the probability of light reflection, resulting in improved LED performance.

Implementation Method 1

the second-type semiconductor layer has a first region with a first resistance and a second region with a second resistance smaller than the first resistance

Methodology Applied
Scientific EffectElectrical Resistance: Electrical Resistance

Implementation Method 2

a rough surface formed through ion implantation

Methodology Applied
Scientific EffectIon Implantation: Ion Implantation

Data Source

PatentUS8247838B2Light emitting diode with semiconductor layer having different resistance at different regions
Publication Date: 2012.08.21 UNITED MICROELECTRONICS CORP
  • US8247838B2 patent drawing
  • US8247838B2 patent drawing
  • US8247838B2 patent drawing

AI summary

A light emitting diode and a fabricating method thereof are provided. The method including the steps of sequentially forming a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer with a first region and a second region on a substrate. Next, an ion implantation process is performed to make the resistance of the first region be larger than of the second region. Afterward, a first electrode is formed above the first region of the second-type semiconductor layer. Since the method uses the ion implantation process to make the inner resistance of the second-type semiconductor layer various, the light emitting intensity and efficiency may both be increased.