Li-Based PECVD Film Deposition for 3D Electrode Step Coverage
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Solution Overview
Problem
Current methods for forming lithium-based films on three-dimensional structured electrodes face challenges such as step coverage issues and reduced film forming speed, particularly when using high-energy density lithium secondary batteries with 3D structures, where existing technologies either damage the electrodes or suffer from inefficient deposition.
Innovation Solution
A plasma-enhanced chemical vapor deposition apparatus and method that involves supplying lithium, phosphor, oxygen, and nitrogen source materials into a reaction chamber with controlled plasma generation to form a lithium-based film, allowing for precise bonding and uniform deposition on 3D structures by separating the supply of source materials and using a time interval to prevent impurity intrusion and optimize plasma exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional chemical vapor deposition is used to form lithium-based films on 3D structured electrodes, then the film can be deposited, but step coverage is poor and film forming speed is reduced
Solution Approach 1:
The patent changes the deposition parameters by introducing plasma enhancement to the CVD process. Plasma provides ion bombardment and radical species that improve step coverage by enabling conformal deposition on 3D structures while maintaining high deposition rates, thus resolving the contradiction between manufacturing precision and productivity
Solution Approach 2:
The patent uses composite source materials (lithium compound combined with phosphorus and nitrogen compounds) that decompose in plasma to form LiPON film. This composite approach enables simultaneous improvement of step coverage and deposition speed through plasma-enhanced reaction mechanisms
2Use of energy by moving object
If high-energy density lithium secondary batteries with 3D structures are used, then energy density is improved, but existing film formation technologies either damage the electrodes or suffer from inefficient deposition
Solution Approach 1:
The patent employs periodic plasma generation during the deposition process, controlling plasma on-off cycles to optimize both film quality and electrode protection. The plasma is activated only during specific deposition phases, preventing electrode damage while maintaining efficient film formation on high-energy-density 3D structures
Solution Approach 2:
The patent replaces mechanical or thermal deposition methods with plasma-enhanced chemical vapor deposition. The plasma field provides a gentler, more controlled deposition mechanism that avoids electrode damage while achieving efficient coverage on complex 3D structures with high energy density
3Device complexity
If source materials are supplied simultaneously into the reaction chamber, then deposition process is simplified, but impurity intrusion occurs and film quality deteriorates
Solution Approach 1:
The patent segments the deposition process into distinct phases: first supplying lithium source material, then phosphorus and nitrogen source materials in sequence. This temporal segmentation prevents impurity intrusion and ensures high film quality, while the overall process remains relatively simple through automated sequential control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables fast and uniform deposition of lithium-based films on high-aspect-ratio 3D structures, addressing step coverage problems and enhancing film forming speed while maintaining electrode integrity, suitable for use as solid electrolyte or protective films in lithium secondary batteries.
Implementation Method 1
a power supply configured to supply power into the reaction chamber to generate plasma in the reaction chamber
Implementation Method 2
the controller may controls the power supply to form a bonding between the P source material and the N source material (P—N bonding) using the plasma
Implementation Method 3
The Li source material supplied into the reaction chamber by the first source supply may be adsorbed on the surface of the substrate, and the P and O source materials supplied into the reaction chamber by the second source supply is adsorbed on the Li source material
Data Source
AI summary
A method of forming a lithium (Li)-based film, may include: supplying a Li source material into a reaction chamber in which a substrate is disposed; supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber; and generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials, wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval, and wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material.