Negative Tone Lift-Off Resist Composition for Fine Metal Film Patterning
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Solution Overview
Problem
The challenge is to form more fine resist patterns with higher aspect ratios while minimizing defects such as pattern collapse, and ensuring good removability in the lift-off process for metal film pattern manufacturing.
Innovation Solution
A negative tone lift-off resist composition comprising an alkali soluble resin and specific cross-linkers, represented by formulas (1) and (2), is used to form a resist layer that exhibits improved coatability, solubility, and pattern shape retention, facilitating clear removability even for small pattern sizes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If fine patterning is performed to achieve higher miniaturization, then device performance is improved, but pattern collapse and defects increase
Solution Approach 1:
The patent uses a composite resist composition containing polyvinyl phenol resin, novolac resin, and multiple crosslinking agents (glycerol, pentaerythritol, dipentaerythritol) to create a multi-component system that provides both fine patterning capability and pattern stability, resolving the contradiction between manufacturing precision and reliability
Solution Approach 2:
The patent changes the chemical composition parameters of the resist by incorporating specific ratios of polyvinyl phenol (30-95 wt%) and novolac (5-70 wt%), along with controlled amounts of crosslinking agents, to optimize both the fineness and stability of the patterns under various exposure and development conditions
2Ease of manufacture
If negative tone photoresist is used for lift-off patterning, then metal film formation is enabled, but pattern removability deteriorates
Solution Approach 1:
The patent changes the chemical composition of the negative tone resist by incorporating alkali-soluble components (polyvinyl phenol, novolac) and controlling crosslinking density, which enables the resist to be removed after serving its function in metal film formation, thus resolving the contradiction between ease of manufacture and ease of operation
Data Source
Figure 1(a)~2(f')
Figure 3
AI summary
An object is to provide a resist composition which can form fine resist patterns and keep them. Another object is to provide a negative tone lift off resist composition that defects of resist patterns made from the composition can be decreased. And another object is to provide a negative tone lift off resist composition that removability of resist patterns made from the composition is good. [Solution] The present invention provides a negative tone lift off resist composition comprising alkali soluble resin and cross linkers. And the present invention provides a method for manufacturing metal film patterns on a substrate. The present invention provides a method for a manufacturing a device comprising metal film patterns manufacturing method.