Light Absorbent Organic Anti-Reflection Coating Composition
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Solution Overview
Problem
Current organic anti-reflection coating compositions fail to effectively absorb light at the undercoat layer during semiconductor lithography, leading to reflection and standing waves, and are not adequately resistant to photoresist solvents, which can result in pattern deformation and loss during etching.
Innovation Solution
A novel light absorbent compound, such as those represented by formulas (1a), (1b), and (2), is incorporated into an organic anti-reflection coating composition, which includes a polymer and thermal acid generating agents to form a crosslinked structure that accelerates curing and prevents dissolution, ensuring effective light absorption and rapid etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional organic anti-reflection coatings are used to reduce reflection rate, then reflection at the undercoat layer is prevented, but the coating is solubilized and destroyed by the photoresist solvent during lamination
Solution Approach 1:
The patent changes the chemical composition parameters of the organic anti-reflection coating by incorporating specific compounds (e.g., silane-based compounds, titanium alkoxides) that form crosslinked structures. This crosslinking transforms the coating from a solvent-soluble state to a solvent-resistant state, maintaining reflection rate control while achieving solvent stability during lamination.
Solution Approach 2:
The patent creates a composite organic anti-reflection coating system combining multiple components: light-absorbing compounds, crosslinking agents, and solvents. This composite structure provides both the optical properties needed for reflection control and the chemical resistance required to withstand photoresist solvents, resolving the contradiction between these two requirements.
2Stability of the object's composition
If the anti-reflection coating is made more resistant to solvent, then it resists dissolution during lamination, but it becomes difficult to etch later
Solution Approach 1:
The patent applies local quality by creating an anti-reflection coating with spatially differentiated properties: the crosslinked structure provides solvent resistance throughout the coating, while specific etch-sensitive functional groups are distributed to enable controlled etching. This allows the coating to simultaneously achieve solvent resistance and etchability through localized chemical functionality.
Solution Approach 2:
The patent uses parameter changes by selecting crosslinking density and etch-group concentration as controllable variables. By adjusting these parameters, the coating achieves optimal balance between solvent resistance (requiring high crosslinking) and etching rate (requiring sufficient etch-sensitive groups), resolving the contradiction between these opposing requirements.
3Loss of substance
If the anti-reflection coating etches faster than photoresist, then photoresist loss is reduced, but the coating structure becomes unstable
Solution Approach 1:
The patent applies preliminary action by pre-forming a stable crosslinked anti-reflection coating structure before the etching process. The coating is cured to achieve structural stability, then etched at a controlled rate that removes material faster than photoresist loss while maintaining the underlying stable crosslinked framework. This prevents coating collapse during the etching process.
4Ease of manufacture
If conventional materials are used for anti-reflection coating, then manufacturing is simple, but they cannot provide appropriate optical properties for various exposure processes
Solution Approach 1:
The patent achieves universality by developing an anti-reflection coating composition with adjustable parameters that can adapt to different exposure processes. The base composition provides universal ease of manufacture through simple spin-coating, while variable components (crosslinking agents, solvents, additives) can be adjusted to optimize optical properties for specific applications, achieving both simplicity and adaptability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves reduced reflection, stable adhesion, and rapid etching, enabling precise ultrafine patterning with broad process windows and preventing pattern deformations like undercut or footing, thus supporting high integration in semiconductor devices.
Implementation Method 1
the organic anti-reflection coating composition should contain a material which is capable of absorbing light in the region of the wavelength of the exposure light source
Implementation Method 2
compounds such as amine or acid should migrate to the photoresist layer, because these compounds may cause deformation in the photoresist pattern
Implementation Method 3
the anti-reflection coating must be designed to have a thermally curable structure, and curing should be accelerated by carrying out a baking process after coating
Data Source
AI summary
The present invention relates to a light absorbent for organic anti-reflection coating formation, and an organic anti-reflection film composition containing the same. The light absorbent for organic anti-reflection film formation according to the present invention is a compound of the following formula (1a), a compound of the following formula (1b), a mixture of compounds of the formulas (1a) and (1b):wherein X is selected from the group consisting of a substituted or unsubstituted cyclic group having 1 to 20 carbon atoms, aryl, diaryl ether, diaryl sulfide, diaryl sulfoxide and diaryl ketone; and R1 is a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or an aryl group having 1 to 14 carbon atoms.