Light Absorber Manufacturing via Ion Beam Etching
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Solution Overview
Problem
Infrared cameras face challenges in reducing stray light and diffuse reflection, particularly in the infrared spectrum, which is not effectively addressed by conventional black coatings used in visible light cameras.
Innovation Solution
A method involving ion beam irradiation of a resin substrate, followed by alkaline etching to create an uneven surface, and subsequent transfer of this surface to a transfer body, such as a metal film, photocurable resin, or silicone rubber, to produce a light absorber with low reflectance across a wide range of wavelengths.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If conventional black coating is applied to reduce stray light and diffuse reflection, then visible light reflectance is reduced, but infrared light reflectance cannot be effectively reduced
Solution Approach 1:
The patent applies different surface structures optimized for different wavelength ranges: a first surface structure (conical protrusions) for visible light and a second surface structure (needle-like protrusions) for infrared light. This local differentiation allows each surface to effectively reduce reflectance in its target wavelength range, resolving the contradiction between visible and infrared light performance.
Solution Approach 2:
The patent uses a composite structure combining glassy carbon base material with metal film layers (nickel and chromium). The glassy carbon provides the foundational low-reflectance properties, while the metal films enhance durability and contribute to infrared reflectance reduction. This composite approach enables effective stray light reduction across both visible and infrared spectra.
2Object-affected harmful factors
If ion beam irradiation and etching are used to form low reflectance surface, then reflectance is reduced, but manufacturing complexity increases
Solution Approach 1:
The manufacturing process is segmented into distinct sequential steps: ion beam irradiation to create latent tracks, chemical etching to form protrusions, metal film deposition, and pattern transfer. This segmentation allows each step to be optimized independently and performed using standard equipment, reducing overall manufacturing complexity while achieving low reflectance.
Solution Approach 2:
The ion beam irradiation creates latent tracks in the glassy carbon before etching begins. This preliminary action prepares the material structure in advance, allowing the subsequent chemical etching to proceed efficiently and form the desired conical and needle-like protrusions without requiring complex real-time control during etching.
3Object-affected harmful factors
If complex multi-layer film structure is formed to achieve low reflectance, then reflectance is reduced, but manufacturing cost and process difficulty increase
Solution Approach 1:
The glassy carbon substrate serves multiple functions: it provides the base material for surface structure formation, contributes to low reflectance properties, and offers durability and stability. This multi-functionality reduces the need for additional specialized layers, simplifying the overall structure and reducing manufacturing cost while maintaining effective reflectance reduction.
Solution Approach 2:
The patent uses a photoresist pattern transfer process where a designed pattern is copied onto the metal film layers through photolithography. This copying approach allows precise control of the surface structure geometry without requiring complex direct fabrication methods, reducing both manufacturing difficulty and cost while achieving the desired low-reflectance surface morphology.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a total reflectance of 0.1% or less at specific wavelengths, effectively reducing stray light and diffuse reflection, and can be reused, offering durability, low cost, and flexibility, suitable for various infrared applications.
Implementation Method 1
a first step of irradiating a resin substrate with an ion beam
Implementation Method 2
a second step of etching the irradiated resin substrate with an alkaline solution to form an uneven surface on its surface
Implementation Method 3
a light absorber having a low reflectance over a wide range of wavelengths
Implementation Method 4
The uneven shape formed on the resin substrate by ion beam irradiation and etching is transferred to the transfer body
Data Source
AI summary
This method for manufacturing a light absorber includes: a first step for irradiating a resin substrate with ion beams; a second step for etching the irradiated resin substrate with an alkaline solution to form an uneven surface on the surface thereof; a third step for forming a transfer body which covers the uneven surface of the etched resin substrate; and a fourth step for peeling off the transfer body from the resin substrate to obtain a light absorber. A metal film, a photocurable resin, and a silicone rubber are disclosed as an example of the transfer body.