Light Augmented Scalp Treatment for Fungal Growth Reduction
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Solution Overview
Problem
Current antimicrobial and anti-dandruff treatments for scalp and skin are insufficient in achieving superior microbial and fungal infection control, particularly for dandruff, as they lack effective synergy between active agents and electromagnetic radiation exposure.
Innovation Solution
A method involving the application of a composition containing pyrithione or its metal salts, iron chelators, and 2-Pyridinol-N-oxide, followed by exposure to electromagnetic radiation within the UV-Visible spectrum of 350 nm to 500 nm, which enhances antimicrobial efficacy by reducing fungal growth by at least 50% as measured by the Fungal Growth Sensitivity Test.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional antimicrobial compositions are applied to scalp or skin, then basic anti-microbial activity is achieved, but superior anti-dandruff and anti-fungal efficacy cannot be achieved
Solution Approach 1:
The patent combines multiple active ingredients (antimicrobial agent, chelating agent, and surfactant) into a single composition that is applied to the scalp or skin. This merging of components works synergistically to achieve superior anti-dandruff and anti-fungal efficacy compared to using individual agents alone.
Solution Approach 2:
The patent introduces electromagnetic radiation exposure as an additional parameter to the treatment method. By controlling the wavelength and duration of radiation exposure, the treatment achieves enhanced antimicrobial activity and superior anti-dandruff efficacy without overly complicating the overall procedure.
2Reliability
If electromagnetic radiation exposure is added to the treatment method, then superior antimicrobial and anti-fungal efficacy is achieved, but treatment procedure complexity increases
Solution Approach 1:
The composition is applied to the scalp or skin first, allowing the active ingredients to be deposited and absorbed before electromagnetic radiation exposure. This preliminary action ensures that the active agents are in position to work synergistically with the radiation, enhancing efficacy while maintaining operational simplicity.
Solution Approach 2:
The treatment method continues the useful action of antimicrobial treatment by adding radiation exposure immediately after composition application. This continuous approach maintains the therapeutic effect throughout the treatment process, achieving superior results without requiring separate, disconnected treatment steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach provides superior anti-dandruff and antimicrobial efficacy, potentially stimulating hair growth, reducing hair loss, and making hair appear thicker and fuller, while effectively inhibiting fungal growth.
Implementation Method 1
exposure of the part of the scalp or the skin to which the composition is applied to electromagnetic radiation that corresponds to UV-Visible spectrum at wavelength of 350 nm to 500 nm
Data Source
AI summary
The present invention is directed to a method of treating skin and scalp comprising applying on the scalp or skin a composition comprising a scalp care active selected from the group consisting of 2-Pyridinol-N-oxide, a pyrithione or a polyvalent metal salt of pyrithione, one or more iron chelator having an A log P value of greater than or equal to 0.4 and mixtures therein; exposing the scalp and skin to electromagnetic radiation having wavelength from about 350 nm to about 500 nm and power from about about 0.1 mWatts/cm2 to about 1000 mWatts/cm2 and for a time period from about 2 seconds to about 5 minutes; wherein the antimicrobial treatment results in reduction of fungal growth as measured by the Fungal Growth Sensitivity Test of at least 50% compared to the dark sample.