Light Blocking Layer Patterning Using Heat-Resistant Polymer Composition
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Solution Overview
Problem
Conventional light blocking layers in display devices face challenges in achieving uniform fine patterns and exhibit low heat and chemical resistance, with limited application scope due to their negative type composition and difficulty in patterning.
Innovation Solution
A light blocking layer is formed using a composition comprising a heat resistance polymer, a cross-linking agent, a black colorant, and a solvent, which includes a polybenzoxazole precursor, polyimide precursor, or other heat-resistant materials, along with a cross-linking agent and a base generating agent, allowing for both negative and positive type compositions and improved patterning processes that include coating, heating, exposing, developing, etching, and stripping to achieve a fine pattern and enhanced resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional negative type black photosensitive resin composition is used to form light blocking layer, then the light blocking layer can be patterned through exposing and developing processes, but the manufacturing precision is insufficient and uniform fine patterns cannot be achieved
Solution Approach 1:
The patent changes the chemical composition parameters by introducing heat-resistant polymer materials (polyimide, polybenzoxazole, polyamide) with specific functional groups and molecular structures. This enables the light blocking layer to achieve both fine pattern formation and high heat resistance, resolving the contradiction between pattern precision and material versatility
Solution Approach 2:
The patent creates a composite photosensitive resin composition combining heat-resistant polymers with black pigments (carbon black, RGB black) and cross-linking agents. This composite structure provides both the patterning capability of photosensitive materials and the heat resistance of high-performance polymers, enabling uniform fine patterns while expanding application scope
2Reliability
If conventional light blocking layer composition is used, then the layer can be formed through standard processes, but the heat resistance is low and chemical resistance is insufficient
Solution Approach 1:
The patent incorporates heat-resistant polymer chains and cross-linking agents into the photosensitive resin composition before the patterning process. This preliminary incorporation ensures that the light blocking layer inherently possesses high heat and chemical resistance from the outset, eliminating the need for additional protective treatments while maintaining ease of manufacture through standard exposing and developing processes
3Adaptability or versatility
If conventional photosensitive resin composition is used, then the light blocking layer can be formed, but the application scope is narrow due to negative type limitation
Solution Approach 1:
The patent develops a universal photosensitive resin composition based on heat-resistant polymers that can function as both negative and positive type photoresists depending on the photoinitiator and exposure conditions used. This multi-functional composition expands application scope while maintaining high pattern formation capability through the inherent properties of the heat-resistant polymer matrix
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the realization of a light blocking layer with excellent heat and chemical resistance, capable of forming uniform fine patterns and applicable to both negative and positive type compositions, thereby improving the performance and versatility of display devices.
Implementation Method 1
a cross-linking agent, wherein the cross-linking agent includes at least one functional group represented by Chemical Formula 1
Implementation Method 2
The composition may further include a base generating agent
Implementation Method 3
a heat resistance polymer... The heat resistance polymer may be a polybenzoxazole precursor, polyimide precursor
Data Source
AI summary
A device includes a substrate; a light blocking layer on the substrate; a passivation film covering the light blocking layer on the substrate; a thin film transistor on the passivation film; another passivation film covering the thin film transistor; a color filter on the another passivation film; and an insulation layer on the another passivation film and covering the color filter, wherein the light blocking layer is patterned using a composition including a heat resistance polymer, a cross-linking agent, a black colorant, and a solvent. A method of patterning the light blocking layer is also provided.