Light Blocking Pattern for LCD Aperture Ratio and Leakage
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Solution Overview
Problem
Liquid crystal display (LCD) devices face issues with light leakage between pixel electrodes and signal lines, leading to decreased transmittance and aperture ratio, particularly due to misalignment during substrate coupling and thin edge layers on the display substrate.
Innovation Solution
The implementation of a light blocking pattern on the base substrate, comprising first and second light blocking patterns that overlap with the gate line and pixel electrode, respectively, and a black matrix on the thin film transistor and data line, to effectively reduce light leakage and enhance the aperture ratio.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a conventional shielding electrode is used to block light leakage, then light leakage is reduced, but the aperture ratio decreases due to additional structures
Solution Approach 1:
The patent combines the light blocking function with existing structural elements (gate line, data line, and pixel electrode edges) by forming a continuous light blocking pattern that integrates these components. This merging approach eliminates the need for separate shielding electrodes while maintaining light blocking effectiveness, thereby preserving aperture ratio.
Solution Approach 2:
The gate line, data line, and pixel electrode structures serve dual functions: their original electrical functions and an additional light blocking function. By designing these elements to form a continuous light blocking pattern, the patent makes existing structures multi-functional, reducing the need for additional components and maintaining high aperture ratio.
2Ease of manufacture
If the substrate edge layer is made thin to improve manufacturing, then manufacturing efficiency increases, but light leakage increases at the edges
Solution Approach 1:
The patent applies preliminary anti-action by forming a light blocking pattern that proactively prevents light leakage at substrate edges before it can occur. The light blocking pattern is designed to extend to and cover the thin edge layers, creating a preventive barrier that counteracts the inherent light leakage problem of thin edges while maintaining manufacturing simplicity.
3Adaptability or versatility
If misalignment during substrate coupling occurs, then manufacturing flexibility is maintained, but light leakage increases between pixel electrode and signal line
Solution Approach 1:
The patent implements beforehand cushioning by designing the light blocking pattern to extend beyond the precise alignment boundaries of pixel electrodes and signal lines. This creates a buffer zone or cushion that compensates for potential misalignment during substrate coupling, ensuring that light leakage is blocked even when alignment is not perfect, thus maintaining manufacturing flexibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces light leakage and improves the aperture ratio by blocking light between the pixel electrodes and signal lines, allowing for better image display and manufacturing efficiency without the need for conventional shielding electrodes.
Implementation Method 1
a light blocking pattern on the base substrate... capable of effectively reducing light leakage occurring between a pixel electrode and a signal line
Data Source
AI summary
A display device includes: a base substrate including a pixel area at which an image is displayed; a light blocking pattern on the base substrate; a thin film transistor on the light blocking pattern; a gate line connected to the thin film transistor and lengthwise extending in a first direction; a data line connected to the thin film transistor and lengthwise extending in a second direction; and a pixel electrode in the pixel area and spaced apart from the gate line in the second direction. The light blocking pattern includes: a first light blocking pattern lengthwise extending in the first direction; and a second light blocking pattern overlapping the thin film transistor. The first light blocking pattern overlaps the gate line and the pixel electrode spaced apart from each other in the second direction.