Light Condensing Part in Exposure Apparatus Mask Patterning
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Solution Overview
Problem
The use of small masks in substrate patterning leads to irregular patterns and distorted contact holes at the edge areas due to insufficient light exposure, increasing manufacturing costs and complicating product design with larger bezels.
Innovation Solution
An exposure apparatus employing a light blocking member with a light condensing part, such as a convex lens, to control light distribution and prevent light errors, allowing for precise formation of non-exposed areas on the substrate using multiple small masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a large mask is used for substrate patterning, then the manufacturing cost of the mask increases significantly, but the pattern exposure quality is maintained
Solution Approach 1:
The patent divides a single large mask into multiple small masks arranged in an array. Each small mask covers only a portion of the substrate, allowing the use of inexpensive small masks instead of one expensive large mask while maintaining pattern exposure quality through coordinated illumination of all mask elements.
2Ease of manufacture
If multiple small masks are used for substrate patterning, then the mask manufacturing cost is reduced, but light distribution becomes irregular causing distorted patterns at edge areas
Solution Approach 1:
The patent introduces a light amount adjusting element that provides different light transmission characteristics to different regions. Specifically, the light amount adjusting element transmits more light to edge areas of the substrate where light deficiency occurs, while maintaining normal light transmission to central areas, thereby compensating for the irregular light distribution caused by multiple small masks.
Solution Approach 2:
The light amount adjusting element modifies the light transmission parameter across different spatial regions. By varying the light transmission amount from uniform to non-uniform (with enhanced transmission at edges), the system compensates for the light distribution irregularities inherent in multi-mask configurations.
3Manufacturing precision
If the irregularly exposed edge area is disposed outside the exposure area, then the pattern exposure quality is improved, but the substrate size including bezel increases
Solution Approach 1:
By modifying the light transmission parameter through the light amount adjusting element, the patent enables effective pattern formation within the original exposure area without requiring additional bezel space. The adjusted light distribution compensates for edge effects, allowing the exposure area to remain compact while achieving uniform pattern quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures clearer boundaries between exposed and non-exposed areas, reducing light errors and maintaining pattern integrity, thereby minimizing manufacturing costs and design complexities.
Implementation Method 1
a light condensing part at a side of the light blocking member, where the light condensing part condenses the light
Implementation Method 2
the light condensing part of the light blocking member may include a convex lens. a focus distance of the convex lens of the light condensing part may be substantially the same as the first distance
Data Source
AI summary
An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.