Light Control Sheet Electrode Patterning by Laser Insulating Sections
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Solution Overview
Problem
The production of light control sheets with multiple light control sections requires a significant number of steps due to the patterning of transparent conductive films through etching processes such as resist mask formation, exposure, development, etching, and cleaning.
Innovation Solution
The formation of insulating sections in the transparent electrode layer is achieved through laser irradiation, reducing the number of steps by patterning the transparent conductive film without the need for etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If transparent conductive film is patterned by etching process, then electrode sections can be formed with precise patterns, but the number of production steps increases significantly
Solution Approach 1:
The patent replaces the mechanical/chemical etching process with a laser processing system. The laser beam directly ablates or modifies the transparent conductive film to form electrode sections, eliminating the need for resist mask formation, exposure, development, and chemical etching steps. This substitution of mechanical/chemical processes with optical/thermal processing reduces the number of production steps while maintaining pattern precision.
Solution Approach 2:
The patent changes the processing parameters from chemical etching conditions to laser processing parameters (wavelength, power, scanning speed, pulse duration). By adjusting these laser parameters, the same patterning function is achieved with fewer steps. The laser parameters can be optimized to control the depth and precision of the electrode section formation without requiring multiple sequential chemical processing steps.
2Adaptability or versatility
If multiple etching steps are used for patterning, then complex electrode patterns can be achieved, but production time and cost increase
Solution Approach 1:
The laser processing system can create complex electrode patterns in a single pass by programmatically controlling the laser beam path, replacing multiple sequential etching steps. The computer-controlled laser system can switch between different pattern regions, adjust parameters on-the-fly, and complete complex geometries without requiring multiple mask changes or repositioning operations, thereby improving production efficiency while maintaining pattern complexity capability.
Solution Approach 2:
The laser processing system performs preliminary positioning and parameter optimization before actual patterning. The system can pre-calculate the optimal laser path and parameters for complex patterns, then execute them in a single continuous process. This preliminary preparation enables the system to handle complex electrode patterns efficiently without requiring multiple iterative processing steps, thus improving productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces the production steps and costs while maintaining the functionality of the light control sheet, allowing for efficient and cost-effective manufacturing.
Implementation Method 1
The insulating section is formed by laser irradiation
Implementation Method 2
the insulating section can be formed by laser irradiation
Data Source
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AI summary
A method of producing a light control sheet, the method includes: forming a multilayer laminate in which a light control layer containing a liquid crystal composition is sandwiched between a first transparent conductive layer supported by a first transparent support layer and a second transparent conductive layer supported by a second transparent support layer; and forming an insulating section in the first transparent conductive layer by laser irradiation to the multilayer laminate by which a laser beam penetrates a transparent support layer, which is one of the first and second transparent support layers located closer to a laser source than the first transparent conductive layer is.