Light Emitting Element Insulating Layer for Defect-Free Patterning
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Solution Overview
Problem
Current display technologies face challenges in achieving high emission efficiency and reliability for light emitting elements, particularly during the manufacturing process, where risks such as defect formation and reduced efficiency are prevalent due to etching processes.
Innovation Solution
A method of manufacturing a light emitting element involving patterning of growth bases, forming semiconductor layers, and using an insulating layer made of materials like aluminium oxide or silicon-based materials to prevent defects and enhance emission efficiency, with a semiconductor stack structure including a first and second semiconductor layer and an active layer, and an insulating layer with a crystalline structure to secure electrical stability and minimize surface defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If etching processes are used to pattern the growth base, then manufacturing precision is improved, but reliability deteriorates due to defect formation
Solution Approach 1:
A sacrificial insulating layer is introduced as an intermediary between the growth base and the semiconductor layers. This layer serves as a protective mediator during etching processes, preventing direct contact between the etchant and the growth base, thereby avoiding defect formation while still allowing precise patterning to occur.
Solution Approach 2:
The insulating layer is formed in advance before the semiconductor layers are deposited. This preliminary action creates a protective barrier that prevents defects from forming during subsequent etching and manufacturing processes, ensuring reliability from the outset.
2Manufacturing precision
If the growth base is fully patterned, then manufacturing precision is improved, but productivity deteriorates due to increased process complexity
Solution Approach 1:
The patterning process is segmented into multiple stages: first patterning the growth base, then forming semiconductor layers, and finally patterning the insulating layer. This segmentation allows each step to be optimized independently, maintaining high precision while improving overall manufacturing efficiency by avoiding the need for a single complex full-pattern step.
3Reliability
If an insulating layer is formed to prevent defects, then reliability is improved, but device complexity increases
Solution Approach 1:
The insulating layer serves multiple functions simultaneously: it acts as a protective barrier during etching, provides electrical insulation, and serves as a sacrificial layer that can be selectively removed. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity while maintaining improved reliability.
Data Source
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AI summary
A method of manufacturing a light emitting element, comprising patterning a first base area of a growth base, forming semiconductor layers, and patterning a portion of a second base area of the growth base, different from the first base area. A resulting light emitting element, and a display device including such a light emitting element are included.