Protective Layer Opening Layout for Multi-Area Light Emitters
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Solution Overview
Problem
Existing light emitting apparatuses face challenges in forming protective film openings of different sizes for light emitting sections with varying light emitting regions, as setting a common etching rate is difficult, leading to either incomplete etching or damage to underlying layers.
Innovation Solution
The light emitting apparatus features a design with electrodes of different areas, where the first protective layer has a first through hole with shifted holes of varying sizes, and the second protective layer has similarly shifted through holes, allowing for controlled etching to expose electrodes without damaging underlying layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a common etching rate is used for protective films covering light emitting sections of different sizes, then the etching process can be simplified, but the etching period cannot be optimized for both large and small openings, resulting in either incomplete etching or damage to underlying layers
Solution Approach 1:
The protective film is divided into multiple regions corresponding to different light emitting section sizes. Each region is assigned a specific opening size that matches the underlying light emitting section, allowing the etching process to be optimized for each region independently while using a common etching rate.
Solution Approach 2:
The protective film is designed with spatially varying properties - different opening sizes in different regions - to match the local requirements of the underlying light emitting sections. This local optimization allows each region to be etched appropriately without compromising other regions.
2Reliability
If the etching period is extended to ensure complete etching of small openings, then small openings are properly formed, but large openings become over-etched and damage occurs to the underlying layers
Solution Approach 1:
The protective film is segmented into regions with different opening sizes, where each region's opening dimension is specifically designed to match the size of the underlying light emitting section. This segmentation allows the etching process to complete etching of small openings without over-etching large openings, preventing damage to underlying layers.
3Object-affected harmful factors
If the etching period is shortened to prevent damage to underlying layers, then underlying layers are protected, but small openings are not completely etched
Solution Approach 1:
The protective film is divided into regions with different opening sizes tailored to the underlying light emitting section sizes. This segmentation enables complete etching of small openings within a safe etching period that does not cause damage to underlying layers.
Solution Approach 2:
The protective film exhibits local quality variations with different opening sizes in different regions, allowing each region to be etched to the appropriate depth without compromising the overall structure or damaging underlying layers.
Data Source
AI summary
A light emitting apparatus according to an aspect of the present disclosure includes a substrate, a first light emitting section, a second light emitting section, a first electrode, a second electrode, a first protective layer, and a second protective layer. The area of the first electrode is greater than the area of the second electrode, the first protective layer has a first through hole, and the second protective layer has a second through hole. The first through hole has a first hole and a second hole, and the second through hole has a third hole and a fourth hole. A first opening area is greater than a second opening area, and a third opening area is greater than a fourth opening area of an opening of the fourth hole that is the opening closest to the substrate, the outer edge of the second opening overlaps with the first electrode, and the outer edge of the fourth opening overlaps with the second electrode. The second opening area is greater than the fourth opening area.