Light-Induced Vaporization of Solid Precursors for CVD

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Solution Overview

Problem

Conventional CVD deposition systems face challenges with low vapor pressures of solid precursors, leading to low deposition rates and transport issues, as well as premature dissociation of precursors during heating, limiting the temperature and practicality of the deposition process.

Innovation Solution

A deposition system and method utilizing light-induced vaporization of solid precursors to form a precursor vapor, which is then delivered to a substrate, allowing for efficient deposition without partial or complete dissociation, and enabling deposition on high-aspect ratio structures at low temperatures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If conventional thermal vaporization is used to vaporize solid precursors, then the precursors can be delivered to the substrate, but the low vapor pressure of solid precursors leads to low deposition rates and transport issues

Engineering Contradiction:

Improvedeposition rateVSAvoidvapor pressure of precursor

Core Design Contradiction:

ProductivityVSQuantity of substance

Solution Approach 1:

The patent replaces conventional thermal vaporization (mechanical/thermal system) with light-induced vaporization (optical system). The light source provides energy to vaporize the solid precursor without requiring high temperatures, thereby overcoming the low vapor pressure limitation and achieving higher deposition rates while avoiding premature dissociation.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the energy delivery parameter from thermal energy (heating) to optical energy (light). This parameter change allows the precursor to be vaporized at lower temperatures, maintaining molecular integrity while achieving sufficient vapor pressure for efficient transport and high deposition rates.

Inventive Principle:

Principle #35Parameter changes

2Productivity

If high temperatures are applied to increase vapor pressure for faster deposition, then the deposition rate improves, but the precursors partially or completely dissociate prematurely

Engineering Contradiction:

Improvedeposition rateVSAvoidmolecular integrity of precursor

Core Design Contradiction:

ProductivityVSStability of the object's composition

Solution Approach 1:

The patent substitutes thermal energy with optical energy for vaporization. The light-induced process provides sufficient energy to overcome intermolecular forces and vaporize the precursor without reaching temperatures that cause molecular dissociation, thereby maintaining precursor stability while achieving high deposition rates.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent utilizes a direct phase transition from solid to vapor through light-induced sublimation, bypassing the liquid phase and avoiding the temperature ranges where thermal dissociation occurs. This phase transition approach maintains molecular integrity while achieving the necessary vapor pressure for deposition.

Inventive Principle:

Principle #36Phase transitions

3Manufacturing precision

If conventional CVD is used to deposit layers on high-aspect ratio structures, then conformal coverage is achieved, but the low vapor pressure of precursors limits the effectiveness

Engineering Contradiction:

Improveconformal coverageVSAvoidprecursor vapor availability

Core Design Contradiction:

Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent replaces thermal vaporization with light-induced vaporization, generating sufficient precursor vapor without high temperatures. This provides adequate vapor pressure and vapor flow to effectively deliver precursor to high-aspect ratio structures, maintaining conformal coverage while overcoming the limitation of low vapor pressure.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the deposition rate and reduces transport issues, enabling efficient delivery of precursors and preventing premature dissociation, thus facilitating the formation of high-quality layers on substrates with complex geometries.

Implementation Method 1

forming a precursor vapor by light-induced vaporization of a solid precursor

Methodology Applied

Scientific EffectLight-induced vaporization: Evaporation

Implementation Method 2

exposing the substrate to a process gas containing the precursor vapor to deposit a layer including at least one element from the precursor vapor on the substrate

Methodology Applied

Scientific EffectVapor deposition: Physical Vapour Deposition

Data Source

PatentUS8197898B2Method and system for depositing a layer from light-induced vaporization of a solid precursor

Publication Date: 2012.06.12 TOKYO ELECTRON LTD

AI summary

A method and system for depositing a layer from a vaporized solid precursor. The method includes providing a substrate in a process chamber of a deposition system, forming a precursor vapor by light-induced vaporization of a solid precursor, and exposing the substrate to a process gas containing the precursor vapor to deposit a layer including at least one element from the precursor vapor on the substrate.