Microlithography Projection Exposure Light Quiver Control
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Solution Overview
Problem
Current projection exposure methods face challenges in achieving near-instantaneous fine optimization of imaging properties and maintaining good imaging quality under various operating conditions, particularly due to variations in the light quiver, which can lead to lithographic aberrations such as vignetting and telecentricity aberrations.
Innovation Solution
Incorporating a light quiver detection system to determine light quiver parameters, such as position, form, and size, and using these parameters in the operating control system to adjust manipulator actuating values, thereby limiting actuating value changes to prevent lithographic aberrations. This involves measuring intersection surface properties and using sensitivity data to control the projection exposure apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manipulator actuating values are adjusted to optimize imaging properties, then imaging quality can be improved, but light quiver variations may cause lithographic aberrations such as vignetting and telecentricity aberrations
Solution Approach 1:
The patent implements a feedback mechanism where light quiver parameters are continuously measured during projection exposure and used to adjust manipulator actuating values. The operating control system receives light quiver parameter data and automatically modifies manipulator settings to compensate for light quiver variations, thereby preventing lithographic aberrations while maintaining optimized imaging quality.
Solution Approach 2:
The patent replaces traditional mechanical adjustment methods with a control system that uses measured light quiver parameters to automatically adjust manipulator actuating values. This substitution of direct mechanical control with a measurement-based control system allows for more precise compensation of light quiver variations without introducing additional mechanical errors.
2Reliability
If light quiver parameters are measured and used to control manipulator actuating values, then lithographic aberrations can be limited, but the device complexity increases due to the light quiver detection system
Solution Approach 1:
The patent integrates the light quiver detection system into the existing projection exposure apparatus, allowing the same optical path and detection infrastructure to serve multiple functions: measuring light quiver parameters, monitoring imaging quality, and providing data for manipulator control. This multi-functionality reduces the need for separate dedicated systems and minimizes overall device complexity.
Solution Approach 2:
The system uses the projection exposure apparatus's own operational data (light quiver parameters measured during normal exposure) to automatically control and optimize its own performance. The operating control system processes the measured parameters and adjusts manipulator actuating values without requiring external intervention or additional complex control infrastructure.
Data Source
AI summary
A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided. The method includes determining at least one light quiver parameter which describes a property of a light quiver, and controlling the operation of the projection exposure apparatus taking account of the light quiver parameter.