Light-Shielding Substrate Transfer Device for Photo-Corrosion Prevention
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Solution Overview
Problem
Substrate processing apparatuses face challenges in preventing photo-corrosion of copper interconnects during maintenance work, as exposure to light can occur when the maintenance door is open, and insufficient positioning adjustment can lead to substrate damage and transfer failures.
Innovation Solution
The apparatus incorporates light-shielding processing units and transfer areas with light-shielding walls and maintenance doors, along with a substrate transfer device featuring support arms with a predetermined clearance to prevent light exposure and substrate damage during maintenance, allowing for continuous processing without stopping the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If the maintenance door is opened for maintenance work, then accessibility for maintenance is improved, but light enters the apparatus causing photo-corrosion of copper interconnects
Solution Approach 1:
The apparatus is divided into light-shielded processing areas and light-exposed transfer areas, with light-shielding walls separating them. This segmentation allows maintenance doors in transfer areas to be opened without exposing substrates in processing areas to light, enabling maintenance while preventing photo-corrosion.
Solution Approach 2:
Light-shielding walls act as intermediaries between the maintenance door area and the processing areas. These walls block light from entering the processing areas even when maintenance doors are open, allowing maintenance personnel to access the apparatus without causing photo-corrosion to substrates.
2Object-affected harmful factors
If the apparatus is stopped during maintenance work, then photo-corrosion is prevented, but productivity decreases
Solution Approach 1:
The apparatus segments processing areas from transfer areas using light-shielding walls. This allows the processing areas to continue operating under light-shielded conditions while maintenance is performed in the transfer areas, maintaining productivity without causing photo-corrosion.
Solution Approach 2:
The light-shielding walls enable continuous substrate processing in the processing areas while maintenance work is performed in the transfer areas. Substrates can be continuously transferred and processed without stopping the apparatus, maintaining productivity while preventing photo-corrosion.
3Device complexity
If positioning adjustment between substrate transfer device and substrate support is insufficient, then device complexity is reduced, but substrate damage and transfer failures occur
Solution Approach 1:
The support arms are designed with a predetermined clearance parameter that allows for positioning adjustments without requiring complex adjustment mechanisms. This clearance parameter enables the substrate to be transferred reliably even with positioning variations, maintaining reliability while avoiding excessive device complexity.
Data Source
AI summary
A substrate processing apparatus can prevent photo-corrosion of, e.g., copper interconnects due to exposure of a surface to be processed of a substrate to light, and can perform processing, such as cleaning, of a substrate surface while preventing photo-corrosion of, e.g., copper interconnects due to exposure to light. The substrate processing apparatus includes a plurality of processing areas housing therein processing units which have been subjected to light shielding processing; and at least one transfer area housing therein a transfer robot and disposed between two adjacent ones of the plurality of processing areas. A light shielding wall is provided between the transfer area and each of the two adjacent processing areas, and a light-shielding maintenance door is provided for the front opening of the transfer area. The processing units are coupled to the light shielding walls in a light-shielding manner.