Linear-Antenna Plasma Chamber With Positive Bias Electrode
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Solution Overview
Problem
Existing plasma treatment apparatuses for substrates face complexity and high costs when performing multiple plasma treatment processes due to the need for changing treatment conditions, as the base material and conveyance system share the same negative potential, complicating the device configuration and increasing costs.
Innovation Solution
A plasma treatment apparatus with a bias electrode that applies a positive bias voltage to control plasma potential, allowing the base material to be grounded, and uses a linear antenna to generate plasma while maintaining the conveyance system at ground potential, enabling continuous performance of multiple plasma treatments with different conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple plasma treatment chambers operate with different negative potentials for various plasma processes, then different plasma treatment conditions can be achieved, but the device complexity and cost increase significantly
Solution Approach 1:
The plasma treatment system is divided into multiple independent chambers, each capable of operating with its own bias electrode and plasma generation conditions. This segmentation allows each chamber to be optimized for specific plasma processes while maintaining overall system simplicity through modular design.
Solution Approach 2:
Instead of applying negative potential to the base material and conveyance system as in conventional systems, this invention applies positive bias potential to the plasma itself through the bias electrode. This inversion allows the base material and conveyance system to remain at ground potential, eliminating the complexity of maintaining multiple negative potentials across different chambers.
2Ease of operation
If negative DC voltage or pulse voltage is applied to the base material for ion irradiation, then plasma treatment can be performed, but the base material and conveyance system must share the same negative potential making the configuration complicated and expensive
Solution Approach 1:
A bias electrode is introduced as an intermediary component between the plasma generation source and the base material. This bias electrode applies the necessary positive bias potential to confine and control the plasma, while the base material itself remains at ground potential. This intermediary approach enables plasma treatment without requiring the base material or conveyance system to operate at negative potential.
Solution Approach 2:
The electrical potential parameters are fundamentally changed: instead of applying negative potential to the base material, the system applies positive bias potential to the plasma through the bias electrode. This parameter change allows the base material to be held at ground potential throughout the treatment process, simplifying the overall system configuration.
3Device complexity
If the base material is held at ground potential while applying positive bias to plasma, then safety is improved and costs are reduced, but plasma generation and confinement becomes more challenging
Solution Approach 1:
The bias electrode is designed with a nested structure that surrounds the plasma generation region. This nested configuration allows the bias electrode to effectively confine the plasma while maintaining a compact overall structure. The positive bias potential applied to the nested bias electrode creates an electric field that confines the plasma within the treatment chamber, ensuring stable plasma generation even with the base material at ground potential.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration simplifies the apparatus, reduces costs, and enhances safety by keeping the base material and conveyance system at ground potential, while allowing efficient and continuous plasma treatment with controlled plasma potential and uniform surface treatment.
Implementation Method 1
feed high frequency electric power to one end portion of the antenna conductor in a longitudinal direction, directly ground the other end portion to flow high frequency current thereto, generate plasma using an induced electromagnetic field generated in the vicinity of the antenna conductor
Implementation Method 2
a heating part which heats the treated base material
Implementation Method 3
a bias electrode which applies a bias voltage to the plasma... the plasma potential of the discharge plasma generated by the linear antenna can be controlled, and simultaneously, a diffusion region of the discharge plasma can be confined in the bias electrode
Data Source
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AI summary
A plasma treatment apparatus includes a plasma treatment chamber in which a treated base material is accommodated, a conveyance part which conveys the treated base material into the plasma treatment chamber, an inductive coupling linear antenna configured to generate plasma, a bias electrode which modules a plasma potential, and a heating part which heats the treated base material. A cross section of the bias electrode cut perpendicularly to a longitudinal direction has a dome-shaped or U-shaped box shape, and the inductive coupling linear antenna and the heating part are disposed substantially in parallel in the bias electrode in the longitudinal direction of the bias electrode.