Linear Plasma Electron Source for Uniform Beam Distribution
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Solution Overview
Problem
Modern manufacturing processes for large area substrates and foils require increased energy density and throughput, but existing electron sources struggle to efficiently provide uniform electron beams over extended lengths, leading to inefficiencies in processes like sputtering deposition and surface charging.
Innovation Solution
A linear plasma electron source with a housing acting as an anode and a cathode, featuring a slit opening and a gas supply, where the length of the electron source is at least 70 cm and the cathode is designed to maintain a uniform separation space to prevent arcing and ensure uniform gas distribution, allowing for controlled energy distribution and high throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the electron source length is increased to cover large area substrates, then the coverage area is improved, but the uniformity of electron beam energy distribution deteriorates
Solution Approach 1:
The electron source is segmented into multiple independent electrode sections along its length, with each section capable of independent voltage control. This allows the long electron source (at least 70 cm) to be divided into manageable segments that can maintain uniform energy distribution across the entire length while covering large substrate areas.
Solution Approach 2:
Different sections of the electron source are equipped with independently controllable electrodes that can adjust local electric field characteristics. This enables each local region to optimize its electron beam energy distribution according to specific requirements, maintaining overall uniformity across the extended length.
2Use of energy by moving object
If the cathode-to-slit opening distance is reduced to increase electron beam intensity, then the energy density is improved, but the risk of arcing between electrodes increases
Solution Approach 1:
The electrode positioning system allows dynamic adjustment of the cathode-to-slit opening distance. The distance can be optimized during operation to achieve the desired electron beam intensity while maintaining a safety margin to prevent arcing. The system can adaptively adjust parameters based on real-time conditions.
Solution Approach 2:
The invention changes the operational parameters by maintaining specific geometric relationships (length at least 5 times the cathode-to-slit distance, minimum 70 cm length) and controlling gas pressure and composition. These parameter changes enable high electron beam intensity while suppressing arcing through optimized electric field distribution.
3Productivity
If the electron source length is increased to at least 70 cm for high throughput, then the manufacturing speed is improved, but the device complexity increases
Solution Approach 1:
The long electron source (at least 70 cm) is constructed using modular segmented electrodes that can be assembled in series. Each segment follows the same design pattern, simplifying manufacturing and maintenance while achieving the required length for high throughput applications.
Solution Approach 2:
The electron source design incorporates universal electrode structures and gas distribution systems that serve multiple functions simultaneously. The same structural elements provide both electrical insulation and mechanical support, reducing overall complexity despite the extended length.
4Manufacturing precision
If gas pressure is increased to improve plasma density, then the electron beam quality is improved, but the energy loss through collisions increases
Solution Approach 1:
The invention optimizes gas pressure within a specific range and uses gas composition control to achieve the desired balance. By carefully adjusting these parameters and maintaining the specified geometric configuration, the system achieves high plasma density for quality electron beams while minimizing collisional energy losses.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The linear plasma electron source achieves a uniform electron beam with controlled energy distribution, enhancing manufacturing efficiency and throughput by maintaining a high energy density over large areas, reducing energy dissipation, and improving substrate charging and sputtering processes.
Implementation Method 1
linear plasma electron source
Implementation Method 2
US 3,430,091 describes a glow discharge cathode, the cathode and an anode being placed in a chamber which is evacuated to the desired pressure region to establish a glow discharge
Implementation Method 3
cathode body
Implementation Method 4
housing acting as a first electrode... a second electrode being arranged within the housing
Data Source
Figure 1~3
Figure 4~5
Figure 6~9
AI summary
A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.