Linear Plasma Electrode Layout for Grounded Roll-to-Roll Ion Irradiation
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Solution Overview
Problem
Existing plasma treatment apparatuses for roll-to-roll methods complicate and cost excessively due to the need for changing treatment conditions, as both the base material and conveyance system must be at a negative potential for ion irradiation, making the setup impractical.
Innovation Solution
A plasma treatment apparatus with an inductive coupling linear antenna and a bias electrode that applies a positive bias voltage to the plasma, allowing ion irradiation at ground potential, enabling continuous performance of multiple plasma treatment processes with different conditions while keeping the base material and conveyance system at ground potential, thus simplifying the setup and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a negative DC voltage or negative pulse voltage is applied to the base material for ion irradiation in plasma treatment, then ion irradiation can be performed, but the base material and conveyance system must both be at negative potential, making the device complex and expensive
Solution Approach 1:
The patent introduces a bias electrode as an intermediary component between the plasma generation region and the base material. The bias electrode applies negative voltage to generate ions, while the base material remains at ground potential. This mediator approach allows ion irradiation functionality while keeping the base material and conveyance system simple and safe.
Solution Approach 2:
The patent segments the voltage application function: the bias electrode handles the negative voltage for ion generation, while the base material stays at ground potential. This segmentation separates the complex voltage control function from the base material handling system, reducing overall device complexity.
2Ease of manufacture
If the base material and conveyance system are kept at ground potential, then safety is improved and costs are reduced, but ion irradiation becomes difficult without applying negative voltage
Solution Approach 1:
The bias electrode serves as a mediator that provides ion irradiation capability without requiring the base material to be at negative potential. The bias electrode is positioned in the plasma generation region where it can generate ions through negative voltage, which then irradiate the base material at ground potential.
Solution Approach 2:
The patent replaces the traditional approach of electrifying the base material with a field-based approach. Instead of applying voltage directly to the base material (mechanical/electrical connection), ions are generated in the plasma region and naturally accelerate toward the grounded base material, substituting direct electrical connection with electromagnetic field interaction.
3Adaptability or versatility
If multiple plasma treatment processes with different treatment conditions are performed, then treatment versatility is improved, but the device configuration becomes complicated when base material potential must change
Solution Approach 1:
The patent makes the bias voltage dynamic and adjustable while keeping the base material at constant ground potential. The bias electrode voltage can be changed to optimize different plasma treatment processes (cleaning, oxidation, coating), providing treatment versatility without requiring changes to the base material potential or conveyance system configuration.
Solution Approach 2:
The patent achieves treatment condition variability by changing the bias electrode voltage parameter rather than changing the base material potential. Different bias voltages can be applied to optimize ion generation for different treatment processes, while the base material remains at ground potential throughout, simplifying the overall device configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for efficient and cost-effective continuous plasma treatment by maintaining the base material and conveyance system at ground potential, enabling various plasma processes with different conditions to be performed sequentially or in parallel, improving safety and reducing manufacturing costs.
Implementation Method 1
an inductive coupling linear antenna (hereinafter, also simply referred to as a linear antenna) configured to generate plasma
Implementation Method 2
a bias electrode which applies a bias voltage to the plasma
Implementation Method 3
a heating part which heats the treated base material
Data Source
AI summary
A plasma treatment apparatus includes a plasma treatment chamber in which a treated base material is accommodated, a conveyance part which conveys the treated base material into the plasma treatment chamber, an inductive coupling linear antenna configured to generate plasma, a bias electrode which modules a plasma potential, and a heating part which heats the treated base material. A cross section of the bias electrode cut perpendicularly to a longitudinal direction has a dome-shaped or U-shaped box shape, and the inductive coupling linear antenna and the heating part are disposed substantially in parallel in the bias electrode in the longitudinal direction of the bias electrode.