Linear Remote Plasma Source Segmentation
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Solution Overview
Problem
Existing inductively coupled remote plasma sources face challenges in scalability and stability, particularly at high pressure and power levels, leading to radial and axial plasma constriction, which limits the active plasma volume and efficiency.
Innovation Solution
A novel inductively coupled linear remote plasma source with multiple distinct elongated antenna segments and magnetic flux concentrators is used to create separate high-intensity plasma current channels, allowing for scalable plasma density and efficient energy use, with each antenna segment inducing radiofrequency magnetic flux lines through dielectric windows to sustain plasma and produce active species.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of stationary object
If a single external helical coil is used to sustain inductive plasma discharge, then the device complexity is low, but the active plasma volume is limited due to radial and axial plasma constriction at high pressure and power levels
Solution Approach 1:
The single external helical coil is divided into multiple separate inductive applicators, each capable of sustaining its own plasma current path. This segmentation allows each applicator to maintain stable plasma without radial and axial constriction, thereby increasing the total active plasma volume while keeping individual applicator complexity low
Solution Approach 2:
The patent transitions from a single-volume plasma source to a multi-volume array configuration. By distributing multiple plasma current paths throughout the chamber volume, the system achieves increased total active plasma volume without requiring each individual source to be overly complex
2Reliability
If multiple separate inductive applicators are used to increase active plasma volume, then the scalability and stability improve, but the device complexity increases
Solution Approach 1:
The plasma generation system is segmented into multiple independent inductive applicators, each maintaining its own stable plasma discharge. This segmentation improves overall reliability by distributing the plasma generation function across multiple stable, smaller-scale units rather than relying on a single complex system
Solution Approach 2:
The patent optimizes operating parameters for each individual applicator to ensure stable plasma discharge at high pressure and power levels. By tuning parameters such as frequency, power density, and geometry for each applicator, stability is improved without requiring excessive system complexity
3Use of energy by moving object
If a single plasma source is used, then the device simplicity is maintained, but the energy efficiency decreases due to plasma constriction limiting active volume
Solution Approach 1:
Energy input is distributed across multiple separate inductive applicators, each efficiently generating plasma in its own current path. This segmentation eliminates the energy waste associated with plasma constriction in a single source, as each applicator operates in an optimal regime, thereby improving overall energy efficiency
Solution Approach 2:
The multiple plasma current paths operate simultaneously and continuously throughout the chamber volume, ensuring that energy input is consistently converted into useful plasma species across the entire active volume. This continuous distributed action improves energy efficiency compared to intermittent or constrained single-source operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a stable and scalable plasma source with increased active plasma volume and energy efficiency, suitable for various applications including substrate processing, chamber cleaning, and light production, while maintaining simplicity in construction.
Implementation Method 1
each antenna segment inducing radiofrequency magnetic flux lines through dielectric windows to sustain plasma and produce active species
Data Source
AI summary
Methods and apparatus for improved inductively coupled plasma sources are disclosed. A remote linear plasma source can have a plurality of coil segments operable to power intense localized radiofrequency plasma current channels along inner surfaces of a chamber. A plurality of localized intense plasma current channels within a single chamber provides a relatively large active plasma volume, improves efficiency, and provides for favorable residence time and feed gas distribution in a plasma source. In various embodiments, a remote plasma source operable to generate active species is useful for applications such as chamber cleaning, processing materials, ion, electron, and/or neutral beam sources, gaseous discharge lamps, fluorescent lighting, gaseous lasers, and others.