Linear Process Module Layout for Dense, Serviceable Substrate Tools
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Solution Overview
Problem
Existing substrate processing systems face limitations in tool density and accessibility due to circular or circular-like arrangements, which constrain the number and positioning of substrate processing tools within a fabrication room, limiting the number of process modules and hindering maintenance access.
Innovation Solution
A linear arrangement of substrate processing tools with parallel rows of process modules, where RF generators and gas boxes are positioned above the modules, and power distribution and gas interface boxes are strategically placed to maximize tool density and facilitate easy access for maintenance, allowing independent operation of different process modules.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If circular or circular-like arrangements are used for substrate processing tools, then accessibility for maintenance is improved, but tool density is reduced
Solution Approach 1:
The patent transitions from a circular arrangement to a linear arrangement of substrate processing tools. This dimensional change allows tools to be positioned in parallel rows along a linear axis, increasing the number of tools that can be accommodated in a given space while maintaining accessibility through the linear configuration.
2Ease of repair
If circular arrangements are used for substrate processing tools, then maintenance access is facilitated, but the number of process modules is constrained
Solution Approach 1:
The patent employs a linear arrangement with parallel rows of process modules instead of a circular configuration. This linear layout extends the spatial capacity along a linear axis, enabling the incorporation of more process modules while maintaining ease of maintenance access through the organized parallel structure.
3Area of stationary object
If traditional arrangements are used, then space utilization is limited, but aisle space requirements increase
Solution Approach 1:
The patent merges the power distribution assembly and gas interface box into a consolidated configuration positioned on one side of the linear arrangement. This integration eliminates the need for separate aisles for power and gas supply, optimizing space utilization while maintaining operational accessibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The linear arrangement increases tool density and accessibility, enabling efficient use of space and simplifying maintenance by reducing the need for additional aisle space for power distribution and gas supply systems, thus optimizing the substrate processing system's efficiency and serviceability.
Implementation Method 1
a radio frequency (RF) generator configured to generate RF power to create plasma within the processing chamber
Implementation Method 2
a gas box arranged above the process module and configured to selectively supply at least one gas and/or gas mixture into the processing chamber of the process module
Implementation Method 3
Gas mixtures including one or more precursors are introduced into the processing chamber and plasma may be struck to activate chemical reactions
Data Source
AI summary
A substrate processing system includes a vacuum transfer module and a plurality of process modules defining respective processing chambers. The plurality of process modules includes a first row of the process modules arranged on a first side of the vacuum transfer module and a second row of the process modules arranged on a second side of the vacuum transfer module opposite the first side. Each of the plurality of process modules includes a gas box arranged above the process module and configured to selectively supply at least one gas and/or gas mixture into the processing chamber of the process module and a radio frequency (RF) generator configured to generate RF power to create plasma within the processing chamber. The RF generator is arranged above the process module and the gas box and the RF generator are arranged side-by-side above the process module.