Linear Substrate Treating Apparatus with Buffer for Footprint Reduction
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Solution Overview
Problem
The existing substrate treating apparatus has limitations in throughput and footprint due to its stacked treatment layer configuration, which reduces the number of treatable layers and increases the height, leading to inefficiencies in substrate transportation and control.
Innovation Solution
A substrate treating apparatus with a linear configuration of indexer, first, and second treating blocks, where the indexer block transports substrates between a carrier and substrate buffers, and the treating blocks perform treatments without stacking, allowing for increased treatment layers and reduced footprint by using substrate buffers and carrier storage shelves strategically.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If treatment layers are stacked vertically to increase parallel treatment capacity, then productivity increases, but the apparatus height increases and footprint is reduced
Solution Approach 1:
The patent transitions from vertical stacking to horizontal linear arrangement of treatment layers, changing the spatial dimension from vertical (Z-axis) to horizontal (X-axis). This allows multiple treatment layers to be arranged in sequence along the horizontal direction, increasing apparatus length while maintaining manageable height and enabling parallel processing capabilities.
Solution Approach 2:
The apparatus is divided into independent treatment layers (first treating block and second treating block) that can be separately controlled and operated. Each treatment layer functions as an independent module with its own substrate buffer and treatment chamber, allowing parallel operation and flexible configuration without requiring vertical stacking.
2Length of stationary object
If treatment layers are arranged horizontally in sequence, then apparatus height is reduced and footprint is decreased, but substrate transportation complexity increases
Solution Approach 1:
A substrate buffer is introduced as an intermediary component between the indexer block and each treatment layer. This buffer acts as a temporary storage and transfer station, simplifying the transportation control by providing a standardized interface for substrate exchange between blocks, thereby reducing the complexity of direct point-to-point transportation control.
Solution Approach 2:
The linear horizontal arrangement allows substrates to move continuously through the treatment layers in sequence without requiring complex vertical lifting and positioning mechanisms. The substrate transportation follows a continuous horizontal path from the indexer block through the first and second treating blocks, maintaining steady workflow and reducing control complexity.
3Productivity
If more treatment layers are added to increase productivity, then output increases, but the apparatus footprint and height increase
Solution Approach 1:
Instead of expanding the apparatus vertically or increasing footprint area, the patent arranges treatment layers horizontally in a linear sequence along the X-axis. This dimensional reorganization allows multiple treatment layers to be accommodated within a compact footprint by utilizing the horizontal length of the apparatus, thereby increasing productivity without proportionally increasing the apparatus footprint.
4Productivity
If substrate buffers are positioned between indexer and treating blocks, then substrate exchange efficiency improves, but apparatus complexity increases
Solution Approach 1:
The substrate buffer is merged with the indexer block and treating blocks as an integrated component rather than a separate independent unit. The buffer shares the same structural framework and control system with the adjacent blocks, allowing substrate exchange to occur through coordinated movement within the same horizontal plane, thereby improving efficiency without significantly increasing overall apparatus complexity.
Data Source
AI summary
Disclosed are a substrate treating apparatus and a substrate transporting method for the substrate treating apparatus. Two treating blocks are arranged so as not to be stacked, and a first treating block, an ID block, and a second treating block are linearly connected horizontally. Accordingly, the number of treatment layers is increasable while a height of the substrate treating apparatus is suppressed. The first and second treating blocks are each connected to the ID block directly. This enables suppression in step of passing a substrate through a treating block without performing any treatment on the substrate, leading to prevention of decrease in throughput. In addition, a substrate buffer is placed in the middle of the two treating blocks. The two treating blocks enable transportation of substrates W with the substrate buffer. Thus, reduction in footprint of the substrate treating apparatus is obtainable.