Linear Transfer Chamber Layout for Compact Wafer Processing

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Solution Overview

Problem

Existing semiconductor processing systems have a large footprint, leading to increased space requirements and reduced throughput, and suffer from limited process integration flexibility, particularly in cluster-style tools and carousel-style tools.

Innovation Solution

A processing system with a transfer chamber and multiple process chambers arranged in a linear configuration, utilizing a workpiece handling robot that can transfer workpieces using a scissor motion to multiple processing stations, allowing for efficient transfer and processing of multiple workpieces without vacuum or process pressure breaks, enabling flexible integration of various processing steps.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If cluster-style tools are used to process workpieces, then multiple process chambers can be integrated, but the footprint size increases and space efficiency decreases

Engineering Contradiction:
Improveprocess integration flexibilityVSAvoidfootprint size
Core Design Contradiction:
Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

The patent transitions from traditional two-dimensional cluster tool layouts to a three-dimensional configuration by stacking process chambers vertically. Multiple process chambers are arranged in a vertical column rather than spreading horizontally, allowing the system to maintain high process integration capability while significantly reducing the horizontal footprint. The robot arm operates in a vertical workspace to transfer workpieces between stacked chambers.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If more process chambers are added to increase throughput, then processing capacity improves, but the system footprint and space requirements increase

Engineering Contradiction:
ImprovethroughputVSAvoidfootprint size
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The system achieves increased throughput by adding process chambers in the vertical dimension rather than expanding horizontally. Multiple process chambers are stacked one above another, creating a vertical processing column that maintains high productivity while minimizing the horizontal space occupied by the tool.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Area of stationary object

If carousel-style tools are used to reduce footprint, then space efficiency improves, but process integration flexibility is reduced

Engineering Contradiction:
Improvefootprint sizeVSAvoidprocess integration flexibility
Core Design Contradiction:
Area of stationary objectVSAdaptability or versatility

Solution Approach 1:

The patent employs a dynamic, modular process chamber design where chambers can be independently configured and accessed. Unlike fixed carousel configurations, the vertical stack allows flexible routing of workpieces through different chamber sequences, enabling dynamic process integration that can be adapted to various processing requirements while maintaining a compact footprint.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS11923215B2Systems and methods for workpiece processing
Publication Date: 2024.03.05 BEIJING E TOWN SEMICON TECH CO LTD
  • US11923215B2 patent drawing
  • US11923215B2 patent drawing
  • US11923215B2 patent drawing

AI summary

A processing system for processing a plurality of workpieces includes a transfer chamber in process flow communication with a first processing chamber and a second processing chamber, the transfer chamber having a first straight side, wherein the first process chamber includes at least one first processing station, and wherein the first processing chamber is disposed along the first straight side, wherein the second process chamber includes at least two second processing stations, wherein the second processing chamber is disposed along the first straight side, and wherein the second process chamber disposed in linear arrangement with the first process chamber along the first straight side, and wherein the transfer chamber includes at least one workpiece handling robot configured to transfer at least one workpiece to the at least one first processing station and the at least two second processing stations.