Liquid Application Apparatus Droplet Deposition Pitch Control
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Solution Overview
Problem
Existing liquid deposition technologies, such as those described in PTL 1 and 2, do not provide specific hardware or methods for achieving ideal droplet deposition density or droplet ejection volume, limiting the optimization of droplet arrangement on substrates during the imprint lithography process.
Innovation Solution
A liquid application apparatus with a head featuring multiple nozzles that eject droplets, a relative movement device, and control mechanisms for adjusting droplet deposition pitches in both the x and y directions, allowing for optimized droplet arrangement on substrates by changing deposition pitches in units of nozzle pitches or ejection periods.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If droplet deposition density and ejection volume are optimized by changing algorithms only, then droplet arrangement can be partially improved, but the ideal droplet deposition density and arrangement cannot be achieved due to lack of specific hardware control
Solution Approach 1:
The patent applies dynamics by making the droplet ejection system adjustable and adaptable. The head can change droplet ejection periods and deposition pitches dynamically during operation, allowing the system to optimize droplet arrangement for different patterns and requirements rather than being fixed.
Solution Approach 2:
The patent changes physical parameters of the droplet ejection system, specifically the droplet ejection period and deposition pitch. By independently controlling these parameters in x and y directions, the system achieves ideal droplet deposition density and arrangement that cannot be obtained by algorithmic optimization alone.
2Stability of the object's composition
If droplet ejection period is prescribed for discrete deposition, then droplet arrangement uniformity improves, but flexibility in changing deposition pitch is limited without dedicated control devices
Solution Approach 1:
The system dynamically adjusts deposition pitch by changing the droplet ejection period independently in x and y directions. The pitch changing devices enable the system to adapt to different patterns while maintaining uniform droplet arrangement through controlled ejection timing.
Solution Approach 2:
The patent segments the control of deposition pitch into independent x-direction and y-direction control. This allows each direction to be optimized separately for uniform droplet arrangement while maintaining overall flexibility in pitch adjustment.
3Manufacturing precision
If existing inkjet systems are used without pitch changing devices, then device complexity remains low, but the ability to optimize droplet arrangement for fine pattern formation is insufficient
Solution Approach 1:
The pitch changing devices enable dynamic adjustment of droplet deposition pitch in both x and y directions, allowing optimization of droplet arrangement for fine pattern formation. This dynamic control capability directly improves manufacturing precision for imprint lithography.
Solution Approach 2:
By independently changing droplet ejection periods and deposition pitches in x and y directions, the system achieves optimal droplet arrangement for fine pattern formation, overcoming the limitations of existing systems with fixed parameters.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables optimized droplet arrangement, improving wetting properties and reducing residual thickness variation, allowing for the formation of desirable fine patterns on substrates.
Implementation Method 1
a pressure application device which applies pressure to the liquid in the liquid chamber
Implementation Method 2
a droplet ejection control device which operates the head at a prescribed droplet ejection period so as to deposit the droplets discretely onto the substrate
Data Source
AI summary
A liquid application apparatus includes: a head including a plurality of nozzles which eject droplets of liquid having functional properties toward a substrate; a relative movement device which causes the head and the substrate to move relatively to each other in a relative movement direction; a droplet ejection control device which operates the head at a prescribed droplet ejection period so as to deposit the droplets discretely onto the substrate; an x-direction droplet deposition pitch changing device which changes a deposition pitch of the droplets on the substrate in an x direction perpendicular to the relative movement direction; and a y-direction droplet deposition pitch changing device which changes a deposition pitch of the droplets on the substrate in a y direction parallel to the relative movement direction.