Liquid Application Device Stage Rotation Mechanism
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Solution Overview
Problem
The challenge is to perform high-speed three-dimensional applying and drawing processes on objects without increasing the weight of the discharge head, which is exacerbated by the inclusion of a rotation mechanism.
Innovation Solution
The solution involves an application device with a discharge head that lacks a rotation mechanism, utilizing XYZ relatively-moving devices and R-axis and P-axis rotation devices to position the stage for efficient application without rotating the discharge head, allowing for reduced weight and increased mobility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a rotation mechanism is disposed on the discharge head to perform three-dimensional applying and drawing process, then the capability to perform three-dimensional application is improved, but the weight of the discharge head increases
Solution Approach 1:
Instead of rotating the discharge head to achieve three-dimensional application, the patent inverts the approach by keeping the discharge head stationary and rotating the stage holding the workpiece. This allows the discharge head to remain lightweight while still achieving three-dimensional application capability through the rotation of the workpiece stage.
Solution Approach 2:
The patent separates the rotation function from the discharge head and places it on the stage mechanism. The stage is divided into independent rotation units (first and second rotation units) that can rotate the workpiece stage around different axes, while the discharge head remains a separate, lightweight component focused solely on material discharge.
2Adaptability or versatility
If a rotation mechanism is disposed on the discharge head, then three-dimensional applying and drawing process is enabled, but the discharge head cannot move at high speed
Solution Approach 1:
The patent inverts the conventional approach by keeping the discharge head stationary and non-rotating, while enabling three-dimensional application through rotation of the workpiece stage. This inversion allows the discharge head to maintain high movement speed without the weight penalty of rotation mechanisms.
Solution Approach 2:
The patent introduces dynamic rotation capability to the stage rather than the discharge head. The first and second rotation units enable the workpiece stage to dynamically adjust its orientation during the application process, achieving three-dimensional coverage while the discharge head maintains simple linear motion at high speed.
3Adaptability or versatility
If the stage is designed to accommodate rotation devices, then three-dimensional application is achieved, but the width of the stage increases
Solution Approach 1:
The patent utilizes vertical stacking of rotation units rather than horizontal expansion. The first rotation unit and second rotation unit are arranged in different spatial dimensions, allowing the stage to achieve three-dimensional rotation capability without significantly increasing its planar width. The rotation axes are positioned to minimize the stage footprint.
Data Source
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AI summary
[Problem] To provide an application device and an application method that enable a three-dimensional applying and drawing process to be performed without provision of any rotary mechanism on a discharge head. [Solution] An application device and an application method using the same device, the application device comprising a discharge head that includes a discharge device having a discharge port opened in a Z direction, a stage that holds a workpiece, a set of XYZ relatively-moving devices that moves the discharge head and the stage relative to each other, an R-axis rotation device that rotates the stage about an R-axis parallel to an XY plane, a P-axis rotation device that rotates the stage about a P-axis parallel to the XY plane, the P-axis extending in a different direction from the R-axis, a control device, and a stand, wherein the P-axis rotation device is disposed under the R-axis rotation device, and the P-axis rotation device rotates the stage and the R-axis rotation device together.