Processing Liquid Supply Bypass for Filter Particle Contamination
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Solution Overview
Problem
When the circulation of processing liquid in a liquid processing apparatus is restarted after a stop, the filter thermally expands due to temperature changes, causing trapped particles to be released and contaminating the processing liquid.
Innovation Solution
A liquid supply device with a heating mechanism in the processing liquid line, a filter downstream of the heating mechanism, and a controller that determines whether to drain the processing liquid based on temperature sensor readings, allowing the processing liquid to be heated without passing through the filter initially.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the processing liquid is heated and circulated through the filter after a stop, then the filter thermally expands and particles are released, but the processing liquid becomes contaminated
Solution Approach 1:
The circulation path is segmented into two separate paths: a first circulation path that bypasses the filter for heating operations, and a second circulation path that passes through the filter for normal filtration. This segmentation allows the system to heat the processing liquid without forcing particles through the filter into the main circulation line, thereby resolving the contradiction between temperature control and contamination prevention.
Solution Approach 2:
A bypass line acts as an intermediary path during the heating phase, allowing the processing liquid to circulate through the heater without passing through the filter. This intermediary path prevents direct interaction between the thermal expansion of the filter and the main processing liquid circulation, eliminating particle release while maintaining heating functionality.
2Reliability
If the filter is placed upstream of the heating mechanism, then particles are filtered before heating, but thermal expansion releases trapped particles into the processing liquid
Solution Approach 1:
The system segments the circulation into distinct paths: normal circulation passes through the filter for purification, while heating circulation uses a bypass path that avoids the filter. This segmentation allows the filter to maintain trapped particles during heating operations while still providing filtration during normal operation, resolving the contradiction between reliability and particle release.
Solution Approach 2:
The system performs preliminary routing of the processing liquid through the bypass line before heating, ensuring that the filter remains stationary and retains particles during the heating process. This preliminary action prevents particle release by establishing the correct flow path before thermal expansion occurs.
3Reliability
If the processing liquid circulates through the filter during heating, then filtration is maintained, but thermal expansion causes particle release and contamination
Solution Approach 1:
The circulation system is segmented into a filter path and a bypass path, allowing the controller to select which path the processing liquid takes based on operational mode. During heating, the bypass path is selected to avoid filter contamination; during normal operation, the filter path is selected for continuous filtration. This segmentation resolves the contradiction by providing mode-specific flow paths.
Solution Approach 2:
The system dynamically switches between two circulation modes: a heating mode that routes liquid through the bypass line, and a filtration mode that routes liquid through the filter. This dynamic switching allows the system to maintain continuous filtration when needed while preventing thermal expansion contamination during heating operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces contamination of the processing liquid by preventing particles trapped in the filter from being released during temperature changes, thereby maintaining the purity of the processing liquid in the circulation line.
Implementation Method 1
a heating mechanism provided in the processing liquid line and configured to heat the processing liquid flowing through the processing liquid line
Implementation Method 2
The circulation line of the liquid processing apparatus is provided with a filter which removes foreign substances from the processing liquid
Implementation Method 3
a first temperature sensor provided in the filter, the processing liquid line located between the filter and the drain line, or the drain line, and configured to respectively detect a temperature of the filter, the processing liquid line, or the drain line, or to detect a temperature of the processing liquid
Data Source
AI summary
A liquid supply device includes: a processing liquid line through which a processing liquid is supplied to a liquid processor for performing liquid processing on a substrate; a heating mechanism provided in the processing liquid line to heat the processing liquid flowing through the processing liquid line; a filter provided downstream of the heating mechanism in the processing liquid line; a drain line provided downstream of the filter in the processing liquid line and through which the processing liquid flowing through the processing liquid line is drained; a first temperature sensor configured to respectively detect a temperature of the filter, the processing liquid line, the drain line, or the processing liquid; and a controller configured to determine whether to drain the processing liquid from the drain line based on a detection result by the first temperature sensor.