Liquid Ejecting Head Manufacturing via Antireflective Film

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Solution Overview

Problem

Conventional methods for manufacturing liquid ejecting heads, such as inkjet recording heads, face challenges in suppressing the influence of substrate reflection on exposure patterns, particularly in high-density arrangements with narrow liquid channels, leading to variations in liquid channel height and insufficient prevention of substrate reflection.

Innovation Solution

A method involving the formation of a liquid channel mold and a photosensitive resin layer with a specific refractive index range for the antireflective film, which is exposed and developed to create the ejecting orifice, along with forming a liquid supply port and dissolving the mold, effectively reducing substrate reflection and stabilizing the orifice pattern.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the liquid channel width is narrowed to achieve high density arrangement, then productivity increases, but the influence of substrate reflection on exposure pattern worsens

Engineering Contradiction:
Improvehigh density arrangementVSAvoidexposure pattern precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

An antireflective film is introduced as an intermediary layer between the substrate and the photosensitive resin layer. This film mediates the interaction by absorbing or reducing reflected light from the substrate, thereby preventing the reflected light from interfering with the exposure pattern on the photosensitive resin layer, even when the liquid channel width is narrow.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The refractive index of the antireflective film is specifically controlled to be within the range of √n−0.2 to √n+0.2 (where n is the refractive index of the photosensitive resin layer at the exposure wavelength). By changing and optimizing this physical parameter, the film effectively reduces reflection at the interface between the substrate and photosensitive resin layer, maintaining exposure pattern precision in high-density arrangements.

Inventive Principle:
Principle #35Parameter changes

2Device complexity

If the antireflective film is formed only below the liquid channel, then device complexity is reduced, but the prevention of substrate reflection becomes insufficient

Engineering Contradiction:
Improvestructure simplicityVSAvoidexposure pattern precision
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The antireflective film is extended to cover not only the liquid channel region but also the bubbling chamber region and other areas where exposure occurs. This universal coverage ensures that substrate reflection is suppressed across the entire exposure area, preventing defects such as halation and notching in all regions, while still maintaining relatively simple device structure.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Ease of manufacture

If the liquid channel mold is used as etching mask, then ease of manufacture improves, but variation in liquid channel height increases

Engineering Contradiction:
Improveprocess simplicityVSAvoidliquid channel height uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The manufacturing process is segmented into distinct functions: the liquid channel mold serves only as a pattern transfer mask for the antireflective film, while a separate photosensitive resin layer is used to define the final liquid channel structure. This segmentation allows the etching depth to be precisely controlled by the photosensitive resin layer thickness, eliminating height variation caused by etching through the mold itself.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in improved print quality by stabilizing the ejecting orifice pattern and reducing the influence of substrate reflection, enabling precise formation of liquid channels and orifices, suitable for various applications including inkjet recording and biochip production.

Implementation Method 1

reflection from the substrate, occurring upon exposure, is suppressed by the antireflective film

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

forming an antireflective film having a refractive index of √n−0.2 or more to √n+0.2 or less at the exposure wavelength

Methodology Applied
Scientific EffectRefraction: Refraction

Implementation Method 3

exposing and developing the photosensitive resin layer and the antireflective film to form the ejecting orifice

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS8956703B2Method for manufacturing liquid ejecting head
Publication Date: 2015.02.17 CANON KK
  • US8956703B2 patent drawing
  • US8956703B2 patent drawing
  • US8956703B2 patent drawing

AI summary

A method for manufacturing a liquid ejecting head including an orifice plate having an ejecting orifice and a liquid channel, and a substrate having a liquid ejecting energy generating element and a liquid supply port, the method including: (1) forming a liquid channel mold of a soluble resin dissolved in (6) on the substrate; (2) coating the liquid channel mold with a photosensitive resin layer having a refractive index of n at an exposure wavelength used in (4); (3) forming an antireflective film having a refractive index of √n−0.2 or more to √n+0.2 or less at the exposure wavelength used in (4) on the photosensitive resin layer; (4) exposing and developing the photosensitive resin layer and antireflective film to form the ejecting orifice; (5) forming the liquid supply port on the substrate; and (6) dissolving and removing the liquid channel mold from the liquid supply port.