Liquid Ejecting Head Protection Film Atomic Layer Deposition
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Solution Overview
Problem
In liquid ejecting heads, such as inkjet recording heads, electrical contact between lead electrodes and wiring substrates is often hindered by protection films, leading to issues like liquid leakage, ejection failure, and substrate separation due to etching and ink exposure.
Innovation Solution
A liquid ejecting head design featuring a stack of substrates with a protection film that prevents etching and leakage, including a laminate with electrodes connected to a wiring substrate and a protection film formed using atomic layer deposition to cover inner walls of flow paths and surfaces, ensuring electrical connection without impeding diaphragm movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a protection film is formed on lead electrodes, then etching resistance and liquid leakage prevention are improved, but electrical contact between lead electrodes and wiring substrate deteriorates
Solution Approach 1:
The patent applies preliminary action by forming the protection film after establishing electrical connections through through-holes. The through-holes are created first to ensure electrical contact, then the protection film is deposited to provide etching resistance. This sequence resolves the contradiction by prioritizing electrical connection establishment before applying protective coverage.
Solution Approach 2:
The protection film structure implements local quality by having different coverage characteristics in different regions. The film covers the inner walls of flow paths and surfaces where etching protection is needed, while leaving through-holes open to maintain electrical contact. This spatial differentiation allows simultaneous achievement of etching resistance and electrical conductivity.
2Reliability
If a thick protection film is formed, then etching prevention is improved, but diaphragm deformation and liquid ejection performance deteriorate
Solution Approach 1:
The patent applies parameter changes by optimizing the protection film thickness to a specific range that balances etching protection and diaphragm deformation. The film thickness is controlled to be sufficient for etching resistance but thin enough to allow adequate diaphragm movement for liquid ejection.
Solution Approach 2:
The protection film structure implements local quality by having different coverage characteristics in different regions. The film covers the inner walls of flow paths and surfaces where etching protection is needed, while leaving through-holes open to maintain electrical contact. This spatial differentiation allows simultaneous achievement of etching resistance and electrical conductivity.
3Ease of manufacture
If protection film is formed before electrical connection, then manufacturing process simplicity is improved, but electrical contact reliability deteriorates
Solution Approach 1:
The patent applies preliminary action by forming the protection film after establishing electrical connections through through-holes. The through-holes are created first to ensure electrical contact, then the protection film is deposited to provide etching protection. This sequence resolves the contradiction by prioritizing electrical connection establishment before applying protective coverage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents etching and leakage, maintains electrical contact, and ensures reliable operation by using a thin, high-density protection film that enhances ink resistance without obstructing the diaphragm's deformation, thus improving the stability and performance of the liquid ejecting head.
Implementation Method 1
The protection film may prevent or reduce etching of the substrates by liquid in flow paths in the substrates
Implementation Method 2
The protection film may also prevent or reduce liquid leakage, liquid ejection failure, and/or separation of the substrates
Implementation Method 3
a protection film formed using atomic layer deposition to cover inner walls of flow paths and surfaces
Data Source
AI summary
A liquid ejection head manufacturing method comprising a step of forming a laminate, a step of connecting and a step of forming a protection film. The laminate includes electrodes and flow paths of liquid. The step of connecting is connecting terminals of a wiring substrate to terminals of the electrodes. The protection film is formed using atomic layer deposition, on a surface of the laminate defining the flow paths after connecting the terminals.


