Liquid Ejecting Apparatus Adaptive Wiping Control
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Solution Overview
Problem
The existing liquid ejecting apparatuses face instability in liquid ejection after wiping operations due to the amount of liquid adhering to the nozzle surface, which is not effectively managed by the current wiping mechanisms.
Innovation Solution
The apparatus includes a wiping mechanism with a strip-shaped member that absorbs the liquid, a wiping solution supply mechanism, and a control portion that adjusts the amount of wiping solution in the contact region based on the amount of liquid adhering to the nozzle surface, reducing the solution amount for surfaces with more liquid to prevent instability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a fixed amount of wiping solution is supplied to the strip-shaped member regardless of the liquid amount on the nozzle surface, then the wiping operation can be performed consistently, but the liquid ejection becomes unstable when a large amount of liquid adheres to the nozzle surface
Solution Approach 1:
The wiping solution supply mechanism is made dynamically adjustable based on the liquid amount detected on the nozzle surface. The control portion varies the wiping solution supply amount according to the detected liquid amount, transforming a static fixed-supply system into a dynamic adaptive system that responds to changing conditions.
Solution Approach 2:
A feedback loop is established where the liquid amount detection mechanism monitors the liquid amount on the nozzle surface, and this information is fed back to the control portion which adjusts the wiping solution supply amount accordingly. This closed-loop control ensures the wiping operation adapts to the actual liquid conditions.
2Reliability
If the amount of wiping solution is increased to handle large liquid amounts on the nozzle surface, then effective wiping is achieved, but liquid ejection instability occurs due to excessive liquid remaining on the nozzle surface
Solution Approach 1:
The wiping solution supply amount parameter is changed dynamically based on the liquid amount detected on the nozzle surface. When a large liquid amount is detected, a corresponding wiping solution amount is supplied to achieve effective wiping, while avoiding excessive liquid that would cause ejection instability. This parameter adjustment optimizes both wiping effectiveness and ejection precision.
3Reliability
If the amount of wiping solution is decreased to maintain liquid ejection stability, then ejection remains stable, but insufficient wiping occurs when large amounts of liquid adhere to the nozzle surface
Solution Approach 1:
The wiping solution supply mechanism transitions from a static low-supply mode to a dynamic system that increases supply when needed. The control portion detects large liquid amounts and dynamically increases the wiping solution supply to maintain adequate wiping efficiency while preserving ejection stability when liquid amounts are normal.
4Device complexity
If a fixed wiping operation is performed regardless of nozzle surface conditions, then the wiping mechanism operates simply, but the liquid ejection becomes unstable when liquid amounts vary on the nozzle surface
Solution Approach 1:
A feedback control system is introduced where the liquid amount detection mechanism provides information to the control portion, which adjusts the wiping solution supply accordingly. This feedback loop adds intelligence to the wiping mechanism, enabling it to adapt to varying nozzle surface conditions and maintain stable liquid ejection.
Solution Approach 2:
The wiping mechanism becomes self-regulating by using its own liquid amount detection capability to control its wiping solution supply. The system monitors its own operating conditions and automatically adjusts its performance, reducing the need for external intervention while maintaining reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration stabilizes the liquid ejection by adjusting the wiping solution amount according to the nozzle surface conditions, ensuring consistent performance even after successive wiping operations.
Implementation Method 1
a wiping mechanism configured to execute a wiping operation of wiping the nozzle surface with a strip-shaped member, which is configured to absorb the liquid ejected by the liquid ejecting portion
Data Source
AI summary
A liquid ejecting apparatus includes: a liquid ejecting portion configured to eject a liquid from a nozzle disposed in a nozzle surface; a wiping mechanism configured to execute a wiping operation of wiping the nozzle surface with a strip-shaped member, which is configured to absorb the liquid ejected by the liquid ejecting portion, in contact with the nozzle surface; a wiping solution supply mechanism configured to supply a wiping solution to the strip-shaped member before the wiping operation is performed; and a control portion, and the control portion reduces the amount of the wiping solution held in the strip-shaped member in the wiping operation when the nozzle surface with a large amount of the liquid adhering thereto is wiped as compared with the amount of the wiping solution when the nozzle surface with a small amount of the liquid adhering thereto is wiped.