Liquid Filter Thermal Shield for Hot Semiconductor Foreline Gas
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Solution Overview
Problem
Existing semiconductor processing systems face challenges in effectively removing particles from hot gas streams in the fore-line due to potential chemical reactions with water and high water vapor pressure, which can degrade semiconductor thin films and cause vacuum pump failures.
Innovation Solution
A liquid filter apparatus using a liquid medium with a deflecting surface and heat sink to separate particles from gas-laden streams, preventing direct impingement and absorbing heat from the process waste.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If water is used as a liquid medium to separate particles from gas streams, then particle separation efficiency is improved, but water vapor pressure causes degradation of semiconductor thin films and vacuum pump failures
Solution Approach 1:
The patent introduces a thermal shield as an intermediary component between the hot gas stream and the liquid filter medium. This thermal shield prevents direct contact between the gas stream and liquid, eliminating the harmful effects of water vapor pressure on vacuum pumps while maintaining particle separation functionality through the liquid medium
Solution Approach 2:
The invention extracts the harmful thermal energy and water vapor from the gas stream before it reaches the liquid filter medium. By removing these problematic elements through the thermal shield, the system maintains particle separation efficiency without compromising vacuum pump reliability
2Productivity
If hot gas streams are directly contacted with liquid filter medium, then particle separation occurs, but heat transfer degrades the liquid medium and reduces filter lifespan
Solution Approach 1:
The thermal shield serves as a mediator that allows particle separation to occur while preventing direct heat transfer between the hot gas stream and the liquid filter medium. This intermediary structure protects the liquid medium from thermal degradation, extending its operational lifespan
Solution Approach 2:
The system extracts thermal energy from the gas stream through the thermal shield before the gas contacts the liquid filter medium. This pre-cooling process removes the harmful heat that would otherwise degrade the liquid medium and reduce filter lifespan
3Duration of action of stationary object
If mechanical filters are used in fore-lines to trap particles, then vacuum pump life is extended, but particle deposition still occurs and requires routine maintenance shutdowns
Solution Approach 1:
The liquid filter medium acts as an intermediary that captures particles more effectively than mechanical filters. This liquid medium traps particles through dissolution and adsorption mechanisms, preventing them from reaching and depositing on vacuum pump components, thereby extending pump life and maintaining operational continuity
Solution Approach 2:
The patent replaces the mechanical filtration system with a liquid-based filtration system. This substitution uses chemical and physical processes in the liquid medium to capture particles, providing more effective particle removal and preventing the deposition issues that plague mechanical filters
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Efficient particle separation from hot gas streams without degrading semiconductor films, reducing maintenance costs, and extending vacuum pump life by using a liquid filter with a thermal shield to cool and deflect the process waste.
Implementation Method 1
A thermal shield is interposed between the filter liquid and the feed tube outlet. The thermal shield absorbs heat from the process waste
Implementation Method 2
A deflecting surface is interposed between the filter liquid and the feed tube outlet, which deflects the process waste to prevent direct impingement
Implementation Method 3
particles can be separated from large gas flow rates by passing the gas-laden particle stream through a very high flow rate water shower
Data Source
AI summary
A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.