Liquid Immersion Member Control for Exposure Stability
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In liquid immersion exposure apparatuses, liquid flow-out or residue on substrates can lead to exposure failures, resulting in defective device manufacturing.
Innovation Solution
An exposure apparatus with a liquid immersion member and a driving apparatus that controls the movement of a second member relative to a first member to form a liquid immersion space, ensuring different operational movements between exposure terminations and start-ups of adjacent shot regions to prevent liquid flow-out and residue.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid immersion exposure is performed by maintaining liquid in the exposure space, then exposure quality is improved, but liquid flow-out or residue may occur causing exposure failure
Solution Approach 1:
The liquid immersion member is made movable relative to the substrate to dynamically adjust the liquid immersion space. By changing the position of the liquid immersion member between shot regions, the system maintains reliable liquid coverage while enabling successful exposure across multiple shot regions without liquid flow-out or residue issues
2Productivity
If the substrate is moved continuously through the exposure apparatus, then productivity is improved, but liquid may flow out or remain on the substrate between shot regions
Solution Approach 1:
The liquid immersion member performs preliminary action by being positioned to maintain liquid coverage in the exposure space before the substrate arrives at each shot region. This preliminary positioning ensures that liquid is already in place and will not flow out or leave residue when the substrate moves through the exposure area, thereby maintaining exposure quality during continuous substrate movement
3Reliability
If the liquid immersion member is moved between shot regions, then liquid coverage is maintained, but device complexity increases
Solution Approach 1:
The liquid immersion member is integrated with the existing exposure apparatus structure to perform multiple functions: maintaining liquid coverage during exposure, moving between shot regions to prevent liquid flow-out, and potentially serving as part of the substrate handling system. This multi-functionality reduces the need for separate dedicated components, thereby limiting the increase in device complexity while maintaining reliable liquid coverage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses exposure failures and defective device manufacturing by maintaining a stable liquid immersion environment during the exposure process.
Implementation Method 1
a liquid immersion member (5) which forms a liquid immersion space (LS) of the liquid (LQ)
Data Source
AI summary
An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.