Liquid Masking Layer for Zinc Oxide Nanostructure Patterning

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Current methods for preparing zinc oxide nanostructures are limited in their ability to pattern these structures on non-planar substrates, as they rely on traditional semiconductor patterning technologies that are not compatible with non-planar surfaces.

Innovation Solution

A method using a liquid masking layer for hydrothermal growth, where a substrate with a zinc oxide seed layer is placed in a reactor with a lower and upper liquid masking layer, and a precursor liquid layer, allowing for controlled formation of zinc oxide nanostructures on substrates of any shape through adjustment of the precursor liquid layer's height and substrate movement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If traditional photolithography or micro-contact printing is used for patterning zinc oxide nanostructures, then the patterning process can be performed on planar substrates, but it cannot be directly applied to non-planar substrates

Engineering Contradiction:

Improvesubstrate shape compatibilityVSAvoidpatterning process complexity

Core Design Contradiction:

Adaptability or versatilityVSEase of manufacture

Solution Approach 1:

The patent uses liquid masking layers instead of solid masks, allowing the masking material to conform to non-planar substrate surfaces through its liquid state. The liquid masking layer can be applied via drop-casting or spin-coating, enabling patterning on substrates of various shapes including non-planar surfaces, thus resolving the contradiction between substrate shape compatibility and manufacturing ease

Inventive Principle:

Principle #29Pneumatics and hydraulics

Solution Approach 2:

The patent changes the physical state of the masking material from solid to liquid, fundamentally altering how the masking process works. This parameter change allows the masking layer to adapt to non-planar surfaces while maintaining a relatively simple application process through liquid deposition techniques

Inventive Principle:

Principle #35Parameter changes

2Adaptability or versatility

If liquid masking layers are used to enable patterning on non-planar substrates, then substrate shape compatibility is improved, but the process requires additional liquid layers and reactor setup

Engineering Contradiction:

Improvesubstrate shape compatibilityVSAvoidreactor configuration

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The liquid masking layer serves multiple functions simultaneously: it acts as a mask to define patterns, conforms to non-planar substrate surfaces, and can be applied using standard liquid deposition techniques. This multi-functionality reduces the need for specialized equipment while achieving substrate shape compatibility

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Manufacturing precision

If the precursor liquid layer height is adjusted to control pattern pitch, then manufacturing precision is improved, but the process requires precise control of liquid layer dimensions

Engineering Contradiction:

Improvepattern pitch controlVSAvoidliquid layer control

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent replaces mechanical mask positioning with liquid layer height control. Instead of mechanically adjusting mask positions to control pattern pitch, the method uses the height of the precursor liquid layer as the controlling parameter, which can be adjusted through liquid deposition parameters, simplifying the control mechanism while maintaining precision

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables uniform formation of zinc oxide nanostructures on both planar and non-planar substrates, with controlled pattern pitch and shape, maintaining pH and volume stability of the precursor liquid layer, and allowing for application in diverse devices such as photodetectors.

Implementation Method 1

forming zinc oxide nanostructures in a pattern on the substrate through hydrothermal growth by heating the precursor liquid layer for hydrothermal growth

Methodology Applied

Scientific EffectHydrothermal growth:

Implementation Method 2

The lower liquid masking layer may include a material having a higher density than the precursor liquid layer for hydrothermal growth

Methodology Applied

Scientific EffectDensity difference: Density Gradient

Data Source

PatentUS9368346B2Method of fabricating zinc oxide nanostructures using liquid masking layer

Publication Date: 2016.06.14 GWANGJU INST OF SCI & TECH

AI summary

A method of preparing zinc oxide nanostructures using a liquid masking layer is disclosed. The method includes preparing a substrate having a zinc oxide seed layer formed thereon; loading the substrate in a reactor in which a lower liquid masking layer, a precursor liquid layer for hydrothermal growth, and an upper liquid masking layer are disposed in order; and forming zinc oxide nanostructures in a pattern on the substrate through hydrothermal growth by heating the precursor liquid layer for hydrothermal growth.