Liquid Molybdenum Precursor for Stable ALD and CVD Thin Films
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Solution Overview
Problem
Existing molybdenum precursor compounds, whether solid or liquid, face challenges in thermal stability, processability, and uniformity, particularly in forming molybdenum-containing thin films with complex shapes, limiting their application in semiconductor and memory devices.
Innovation Solution
A molybdenum precursor compound represented by Formula 1, which is liquid at room temperature and thermally stable, allowing for deposition via atomic layer deposition (ALD) and chemical vapor deposition (CVD), enabling precise control of film thickness and composition on complex substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If solid molybdenum precursor compounds (MoCl5, MoO2Cl2) are used, then thermal stability is improved, but ease of operation and mass productivity deteriorate due to difficulty in supply and low mass productivity
Solution Approach 1:
The patent changes the physical state parameter of the precursor compound from solid to liquid, and adjusts the molecular structure by introducing specific ligands (R1-R6 alkyl groups, X halogen atoms) to achieve both liquid state at room temperature and sufficient thermal stability for ALD processing
Solution Approach 2:
The patent develops a novel liquid precursor compound that can be easily supplied and processed, replacing the need for complex solid precursor handling systems, thereby improving mass productivity and ease of operation
2Ease of operation
If liquid molybdenum precursor compounds (Mo(tBuN)2(NMe2)2, Mo(NMeEt)4) are used, then ease of operation is improved, but manufacturing precision deteriorates due to poor thermal stability and inability to form high-quality films
Solution Approach 1:
The patent optimizes the thermal stability parameter of liquid precursors by selecting specific ligands with appropriate bond strengths, enabling the liquid compound to maintain structural integrity during heating while still achieving high-quality film deposition
Solution Approach 2:
The patent creates a composite molecular structure combining molybdenum center with specific organic ligands (alkylamino groups) that provide both liquid state properties and thermal stability, achieving synergistic effects that neither component alone could achieve
3Device complexity
If conventional precursors are used, then process simplicity is maintained, but adaptability deteriorates due to inability to form molybdenum-containing thin films with complex shapes and high aspect ratios
Solution Approach 1:
The patent changes the deposition parameters including temperature (200-400°C), pressure, and precursor flow rate to optimize the deposition process for forming films on complex three-dimensional structures with high aspect ratios
Solution Approach 2:
The patent employs dynamic control of the ALD process cycles, including variable heating rates, pulse durations, and flow rates, to achieve uniform film deposition on complex geometries while maintaining process simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The molybdenum precursor compound facilitates the formation of high-quality molybdenum-containing thin films with excellent coverage and uniformity, enhancing semiconductor device characteristics across various applications.
Implementation Method 1
it has been vaporized by heating and applied to a bypass process for supplying a source
Implementation Method 2
depositing a molybdenum-containing thin film by atomic layer deposition
Implementation Method 3
it can be used as an important metallic material that can suppress the leakage current of capacitors that require a high dielectric constant by the integration in DRAM
Data Source
AI summary
A molybdenum precursor compound represented by chemical formula 1 is advantageous for manufacturing processes due to being in a liquid state at room temperature, has excellent thermal stability, and can easily form molybdenum-containing thin films by chemical vapor deposition as well as atomic layer deposition.