Conformable Nanoscale Coatings Using Liquid-Phase Surface Reaction
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Solution Overview
Problem
Atomic layer deposition (ALD) for nanocoating is hindered by expensive equipment, limited availability of gas phase chemical precursors, low deposition efficiency, lack of uniformity, and time-intensive processes due to the difficulty in dispersing substrates into a gas phase.
Innovation Solution
A method involving contacting a substrate with a first liquid organic solvent, adding a liquid agent to form a film, and incorporating a nanocoating precursor that reacts with the liquid agent film to form a nanocoating, utilizing liquid phase precursors that are more accessible and efficient, allowing for uniform coatings in a shorter time frame.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If atomic layer deposition (ALD) is used to form nanocoatings, then coating uniformity and quality are improved, but equipment cost and processing time increase significantly
Solution Approach 1:
The patent replaces the complex mechanical ALD deposition system with a chemical solution-based approach. Instead of using expensive ALD equipment to deposit layers atom-by-atom, the invention uses liquid precursors that chemically react on the substrate surface to form nanocoatings, eliminating the need for sophisticated deposition machinery while achieving comparable coating quality
Solution Approach 2:
The invention changes the physical state parameter of the precursor from gas phase (required in ALD) to liquid phase. This parameter change allows the use of simpler equipment while maintaining coating precision, as liquid precursors can be applied through straightforward浸涂 or spin-coating methods rather than requiring complex vapor deposition systems
2Manufacturing precision
If atomic layer deposition (ALD) is used to form nanocoatings, then coating quality is improved, but processing time increases due to numerous deposition cycles
Solution Approach 1:
The patent merges multiple thin ALD layers into a single liquid precursor application step. Instead of requiring hundreds or thousands of sequential ALD cycles to build up coating thickness, the invention uses a liquid precursor solution that deposits and reacts to form the complete nanocoating in one treatment, dramatically reducing processing time while maintaining coating quality
Solution Approach 2:
The invention enables continuous coating formation through liquid precursor immersion or spin-coating, replacing the discontinuous, cycle-by-cycle ALD process. The liquid precursor continuously reacts with the substrate surface during a single extended treatment period, forming the complete nanocoating without the repeated pause-and-deposit cycles inherent in ALD
3Reliability
If gas phase precursors are used in ALD, then nanocoatings can be formed, but deposition efficiency and precursor availability are limited
Solution Approach 1:
The invention changes the phase parameter of the precursor from gas to liquid, which fundamentally improves deposition efficiency. Liquid precursors have higher concentration and can be applied more rapidly than gas phase precursors, allowing complete nanocoating formation in a single treatment rather than requiring numerous slow ALD cycles
Solution Approach 2:
The patent uses liquid (hydraulic) precursor delivery instead of gas (pneumatic) delivery systems. Liquid precursors can be easily pumped, dispensed, and applied to substrates through simple immersion or spin-coating, providing much higher deposition rates and better precursor availability compared to gas phase delivery methods
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces equipment costs, enhances deposition efficiency, achieves uniform nanocoatings, and significantly reduces processing time, enabling the formation of nanocoatings up to 100 nanometers in a single treatment.
Implementation Method 1
adding a nanocoating precursor in the first liquid organic solvent, wherein the nanocoating precursor reacts with the liquid agent film to form the nanocoating on the surface of the substrate
Implementation Method 2
adding a liquid agent to the first liquid organic solvent to form a liquid agent film on a surface of the substrate
Data Source
AI summary
A method is disclosed for forming nanoscale coatings on a solid substrate surface. In certain embodiments, the method includes the following steps: contacting a substrate with a first liquid organic solvent; adding a liquid agent to the first liquid organic solvent to form a liquid agent film on a surface of the substrate; and adding the nanocoating precursor in the first liquid organic solvent to react the nanocoating precursor with the liquid agent to form the nanocoating on the surface of the substrate.