Liquid Processing Device Branch Path Pump Segmentation
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Solution Overview
Problem
In semiconductor manufacturing, existing liquid processing devices fail to effectively prevent foreign particles from being mixed into the processing liquid, leading to abnormalities in substrate processing.
Innovation Solution
A liquid processing device is designed with a filter in the main flow path, a branch path, and a pump configuration that controls the flow to prevent particles from entering the circulation path, ensuring the processing liquid is not contaminated before reaching the nozzle, thereby minimizing the introduction of foreign matters onto the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the pump has a large liquid contact area for sucking and reserving processing liquid, then the pump can effectively supply processing liquid to the nozzle, but particles inside the pump may be mixed as foreign matters into the processing liquid
Solution Approach 1:
The liquid circulation system is divided into two separate paths: a main flow path that maintains continuous circulation of processing liquid through the reservoir and filter, and a branch path that allows periodic pumping of fresh processing liquid from the reservoir to the nozzle. This segmentation enables the pump to draw liquid without continuously circulating it through the pump chamber, reducing particle mixing while maintaining supply efficiency.
Solution Approach 2:
The system performs preliminary filtration of processing liquid in the main flow path before the liquid is pumped to the nozzle. Additionally, the branch path is designed to periodically introduce fresh processing liquid from the reservoir, preemptively preventing particle accumulation and contamination before it affects substrate processing.
2Stability of the object's composition
If processing liquid is continuously circulated through the pump, then the pump can maintain steady supply to the nozzle, but particles inside the pump mix into the processing liquid causing substrate processing abnormalities
Solution Approach 1:
The invention extracts the pump from the main continuous circulation loop by introducing a separate branch path. The pump operates periodically to supply processing liquid to the nozzle rather than continuously circulating it. This extraction allows the main flow path to maintain stable circulation through filtration while the pump only intermittently draws liquid, preventing particle mixing while maintaining flow stability.
Solution Approach 2:
The branch path acts as an intermediary between the reservoir and the nozzle, allowing periodic pumping of processing liquid without disrupting the continuous circulation in the main flow path. This intermediary path isolates the pump's particle-mixing effect from the main processing liquid stream, maintaining both flow stability and substrate processing quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses the occurrence of abnormalities in substrate processing by maintaining a clean processing liquid, enhancing the yield of semiconductor devices and reducing the need for extensive cleaning and cleaning solution usage.
Implementation Method 1
a filter provided in the main flow path
Implementation Method 2
a pump provided at an end of the branch path
Data Source
AI summary
A liquid processing device includes: a nozzle configured to discharge, onto a substrate, a processing liquid supplied from a processing liquid source, the processing liquid being configured to process the substrate; a main flow path which connects the processing liquid source and the nozzle; a filter provided in the main flow path; a branch path branched from the main flow path; a pump provided at an end of the branch path; and a controller configured to output a control signal to perform a first process of sucking the processing liquid supplied from the processing liquid source by the pump to flow the processing liquid into the branch path and then a second process of discharging the processing liquid of a smaller amount than a capacity of the branch path from the pump to the branch path to discharge the processing liquid from the nozzle.