Liquid Processing Apparatus with Segmented Drying Cup
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Solution Overview
Problem
Conventional liquid processing methods for semiconductor wafers and glass substrates often leave behind atmospheric mist or fumes during drying, which can adhere to the substrate and cause particle contamination due to continuous rotation and shared processing positions.
Innovation Solution
A liquid processing apparatus and method that perform liquid processing and drying at distinct positions, using a substrate holding unit, rotation driving unit, elevating member, processing liquid supply, liquid receiving cup, and a drying cup positioned above the liquid receiving cup, with gas supply and a gas flow path between the cups to prevent mist adherence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate is continuously rotated during drying, then the drying efficiency is improved, but atmospheric mist or fumes adhere to the substrate causing particle contamination
Solution Approach 1:
The patent divides the processing space into distinct liquid processing position and drying position, separating the substrate processing and drying operations in different spatial locations to prevent contamination during drying while maintaining rotation for efficiency
Solution Approach 2:
The patent introduces a gas supply unit that supplies gas to the drying position, using gas as an intermediary medium to prevent atmospheric mist or fumes from adhering to the substrate during the drying process
2Device complexity
If liquid processing and drying are performed at the same position, then the device complexity is reduced, but fumes from liquid processing adhere to the substrate during drying
Solution Approach 1:
The patent segments the processing positions into separate liquid processing position and drying position, with the substrate holding unit capable of moving between these positions to perform different operations, thereby preventing fume adherence while maintaining reasonable device complexity
Solution Approach 2:
The patent introduces vertical positioning with the drying cup located above the liquid receiving cup, utilizing the vertical dimension to separate processing and drying operations spatially, preventing fume contamination while managing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents particle contamination by separating the liquid processing and drying positions, ensuring that fumes like steam or mist are not adhered to the substrate during drying, maintaining a clean atmosphere for effective substrate processing.
Implementation Method 1
a gas supply unit configured to supply gas to the drying cup; a liquid processing method in which gas is supplied to the drying cup
Data Source
AI summary
Disclosed is a liquid processing apparatus capable of performing a liquid processing and a drying processing in a position each having a different height. The liquid processing apparatus includes: a substrate holding unit configured to hold a substrate; a rotation driving unit configured to rotate the substrate holding unit; a substrate holding unit elevating member configured to lift and lower the substrate holding unit; a processing liquid supply unit configured to supply a processing liquid to the substrate; a liquid receiving cup configured to surround the substrate when the processing liquid is being supplied to the substrate; a drying cup located above the substrate and the liquid receiving cup when the processing liquid is being supplied to the substrate. The drying cup surrounds the substrate and located above the liquid receiving cup when the substrate is being dried.