Liquid Processing Apparatus Inclined Support for Substrate Residue
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Solution Overview
Problem
Conventional liquid processing apparatuses face challenges in preventing liquid residue on the bottom surface of substrates, especially when the substrates are bent, due to minute gaps between the substrate and the inclined surface, leading to inaccurate placement and interference with pattern forming surfaces.
Innovation Solution
A liquid processing apparatus with an inclined portion and supporting members that extend from the outer side to the inner side of the substrate, combined with a rotation unit and processing liquid supply system, which uses inert gases to prevent liquid from flowing to the bottom surface and ensures accurate placement by point-contact support.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the substrate is held on an inclined surface which is extended along the circumference of the substrate and the bottom surface of the substrate and the inclined surface are in contact with each other along the substantially entire circumference of the substrate, then the processing liquid can be suppressed from flowing from the top surface of the substrate onto the bottom surface thereof, but if the substrate is bent, a minute gap may be formed between the substrate and the inclined surface, and the processing liquid may flow toward the bottom side of the substrate through this minute gap
Solution Approach 1:
The continuous inclined surface is segmented by introducing multiple supporting members (first supporting members and second supporting members) at different positions. This segmentation allows the substrate to be supported at discrete points, accommodating bending while maintaining the inclined surface's liquid-blocking function. The gaps between supporting members enable the substrate to conform to the inclined surface without forming continuous leakage paths.
Solution Approach 2:
Supporting members are introduced as intermediary elements between the substrate and the inclined surface. These members mediate the contact, allowing the substrate to maintain reliable contact with the inclined surface even when bent. The supporting members transfer the substrate's weight and position it accurately while the inclined surface prevents liquid flow.
2Ease of operation
If spherical supporting members are provided on the inclined surface and the substrate is supported by these supporting members, then the substrate can be supported from below, but when performing a liquid processing on the substrate with a pattern forming surface thereof facing downwards, it may be difficult to place the substrate accurately, and interference between the supporting members and the pattern forming surface may occur
Solution Approach 1:
Different types of supporting members are used at different locations: first supporting members (with larger diameter) are positioned away from the outer edge to provide stable support, while second supporting members (with smaller diameter) are positioned closer to the outer edge to minimize interference with the pattern forming surface. This local differentiation of supporting member properties enables both accurate placement and interference prevention.
Solution Approach 2:
Instead of using a single type of supporting member throughout, the invention inverts the approach by using two different types of supporting members with different characteristics at different positions. The supporting members closer to the edge have smaller diameters to avoid interference, while those farther away have larger diameters for stable support, reversing the conventional uniform approach.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces liquid residue on the bottom surface of substrates while maintaining accurate placement, even when the substrates are bent, by utilizing the inclined surface and supporting members to manage liquid flow and prevent interference with pattern forming surfaces.
Implementation Method 1
an inclined surface which is inclined downwards from an outer side of the substrate toward an inner side thereof
Implementation Method 2
The rotation unit is configured to rotate the inclined portion
Data Source
AI summary
A liquid residue on a bottom surface of a substrate can be reduced while placing the substrate accurately. A liquid processing apparatus includes an inclined portion, a plurality of supporting members, a processing liquid supply unit and a rotation unit. The inclined portion is provided under the substrate, and has an inclined surface which is inclined downwards from an outer side of the substrate toward an inner side thereof and is extended along a circumferential direction of the substrate. The supporting members are protruded from the inclined surface and configured to support the substrate from below. The processing liquid supply unit is configured to supply a processing liquid onto a top surface of the substrate. The rotation unit is configured to rotate the inclined portion. Further, each of the supporting members has a long narrow shape extended from the outer side of the substrate toward the inner side thereof.