Liquid Processing Apparatus with Substrate-Selective Light Heating

The patent applies parameter changes by irradiating light of a specific wavelength range onto the substrate during rinsing. This light irradiation changes the temperature parameter of the processing liquid remaining in high aspect ratio holes or patterns, causing it to heat up and expand. The thermal expansion and increased temperature reduce the viscosity and surface tension of the processing liquid, making it easier to be replaced by rinsing liquid and removed from the substrate, thereby achieving complete cleaning without extending rinsing time.

The patent implements periodic action by controlling the light emitting element to irradiate light onto the substrate at specific stages of the rinsing process. The light irradiation is applied periodically or continuously during the rinsing period, creating thermal cycles that enhance the mixing and replacement of processing liquid with rinsing liquid in high aspect ratio structures, thus improving cleaning efficiency without increasing overall process time.

The patent replaces mechanical heating systems with an optical system. Instead of using conventional heating elements, hot plates, or thermal conduction methods, the invention uses a light emitting element (such as LED or laser) to irradiate light of a specific wavelength range onto the substrate. The processing liquid absorbs this light energy and converts it to thermal energy, achieving heating without direct mechanical contact or complex thermal management systems.

The patent utilizes phase transitions and thermal effects by selecting light wavelengths that are strongly absorbed by the processing liquid. The absorbed light energy causes rapid local heating, which can induce thermal expansion, convection currents, and changes in liquid properties. These phase-related transitions enhance the mixing and replacement of liquids in high aspect ratio structures, improving rinsing efficiency with minimal additional device complexity.