Liquid Processing Apparatus Nozzle Segmentation Strategy
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Solution Overview
Problem
Existing semiconductor manufacturing processes face challenges in achieving high throughput and preventing contamination while minimizing the number of components in liquid processing apparatuses, particularly in supplying chemical liquids to substrates with varying types and timing considerations.
Innovation Solution
A liquid processing apparatus with a first and second processing area, each equipped with individual nozzles for initial processing and a common nozzle shared between areas, controlled to minimize engagement time in each area, allowing for efficient processing of substrates with reduced nozzle count.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single common nozzle is used for both processing areas, then the number of nozzles is reduced, but the throughput and processing efficiency deteriorate due to longer engagement time and potential contamination
Solution Approach 1:
The system segments the nozzle functionality by providing separate individual nozzles for each processing area (first and second nozzles) while maintaining a shared common nozzle. This segmentation allows each processing area to have dedicated nozzle coverage, ensuring high throughput without requiring fully independent nozzle systems, thus resolving the contradiction between reducing nozzle count and maintaining productivity
Solution Approach 2:
The common nozzle is designed to serve multiple functions by supplying chemical liquid to both the first and second processing areas. This multi-functionality reduces the total number of nozzles required in the system while maintaining the ability to process substrates in both areas, directly addressing the contradiction between device complexity and productivity
2Device complexity
If a single common nozzle serves both processing areas, then the number of components is reduced, but the reliability and contamination control worsen due to extended engagement time and exposure to different substrate types
Solution Approach 1:
The system segments the chemical liquid supply function by providing dedicated individual nozzles for each processing area while sharing a common nozzle. This segmentation isolates the chemical liquid supply paths for different substrate types, preventing cross-contamination while maintaining a reduced component count, thus resolving the contradiction between device complexity and reliability
Solution Approach 2:
The common nozzle acts as an intermediary component that supplies chemical liquid to multiple processing areas through a shared pathway. By designing this intermediary with appropriate positioning and control mechanisms, the system reduces the total number of components while maintaining contamination control through controlled engagement times and proper chemical liquid management
3Device complexity
If the common nozzle engages with both processing areas, then fewer nozzles are needed, but the processing time and engagement duration increase, reducing efficiency
Solution Approach 1:
The system segments the processing time by providing dedicated individual nozzles for each processing area that can operate independently. This segmentation allows parallel processing without requiring the common nozzle to sequentially service both areas, reducing total engagement time while maintaining a reduced nozzle count, thus resolving the contradiction between device complexity and time loss
Solution Approach 2:
The system maintains continuous useful action by having the common nozzle supply chemical liquid to both processing areas simultaneously through its shared positioning. This continuity eliminates idle time between servicing different areas, reducing total engagement time while maintaining fewer nozzles, directly addressing the contradiction between nozzle count and time loss
Data Source
AI summary
To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.