Liquid Processing Apparatus Nozzle Switching Optimization
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Solution Overview
Problem
The existing liquid processing methods for semiconductor manufacturing, particularly those using Sulfuric Acid Hydrogen Peroxide Mixture (SPM), require significant time for switching between processing and rinsing liquids due to sequential supply and discharge operations, which prolongs the overall processing time.
Innovation Solution
A liquid processing apparatus and method that includes a substrate holding unit, dual nozzles for processing liquids, a discharge mechanism capable of switching between paths, and a control unit that initiates nozzle and discharge mechanism switching operations before the completion of the first process, determining the longer switching time as the maximum preparation time to overlap these operations with the first process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If sequential switching operations are performed between first nozzle and second nozzle, then reliable liquid supply switching is achieved, but processing time increases
Solution Approach 1:
The discharge mechanism switching operation is performed in advance during the first process, before the nozzle switching operation. Specifically, the discharge mechanism is switched from the first discharge path to the second discharge path while the first nozzle is still supplying liquid, so that when the nozzle switching is completed, the discharge mechanism is already ready to discharge from the second discharge path. This preliminary action eliminates the sequential waiting time and achieves overlapping execution of switching operations.
2Reliability
If multiple switching operations are performed sequentially, then proper liquid discharge paths are ensured, but overall processing time is prolonged
Solution Approach 1:
The discharge mechanism switching is performed preliminarily during the first process, so that the second discharge path is ready before the second nozzle begins supplying liquid. This ensures proper liquid discharge path accuracy while eliminating the need to wait for discharge path switching after nozzle switching, thereby improving processing efficiency.
Solution Approach 2:
The switching operations are arranged to overlap and execute continuously without idle waiting time. The discharge mechanism switching occurs during the first process, and the nozzle switching occurs during the second process, ensuring that both switching operations are performed without interrupting the useful liquid processing actions, thus maintaining continuous productive operation.
3Ease of operation
If switching operations are performed after first process completion, then proper sequence is maintained, but additional time is added between processes
Solution Approach 1:
Instead of performing discharge mechanism switching after the first process completes, the switching is performed preliminarily during the first process. This maintains the proper sequence where the discharge mechanism is ready before the nozzle switches, while eliminating the idle time between process completion and switching operation.
Solution Approach 2:
The discharge mechanism switching operation is executed during the first process rather than after it completes, ensuring that the useful action of liquid discharge continues without interruption. The switching occurs in the background during ongoing processing, eliminating idle time and maintaining continuous productive operation.
Data Source
AI summary
Disclosed are a liquid processing device, and a liquid processing method. The liquid processing method includes a first process that includes supplying a first processing liquid to the substrate and discharging the first processing liquid within the processing space from a first discharge path, a second process that includes supplying a second processing liquid to the substrate and discharging the second processing liquid within the processing space from the second discharge path, and after stop supplying of the first processing liquid and prior to beginning of the second process, a nozzle switching operation switching from the first nozzle to the second nozzle and a discharge mechanism switching operation switching from the first discharge path to the second discharge path are performed. A longer one of a time to switch the nozzle and a time to switch the discharge mechanism is determined as a maximum preparation time and the switching operations begin at an earlier time than the completion time of the first process by the maximum preparation time or more.