Liquid Raw Material Level Control for Stable Film Thickness

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Solution Overview

Problem

Existing gas supply systems for film formation processes face challenges in accurately controlling the liquid surface level of raw materials, leading to variations in film thickness and raw material gas generation.

Innovation Solution

A method and apparatus for supplying a liquid raw material to a gas supply system, which includes a raw material storage tank, heating units, a liquid surface level detecting unit, and a controlled supply mechanism to repeatedly add a specified amount of liquid raw material when the surface level falls below a target level, ensuring consistent gas generation and film formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If continuous supply of liquid raw material is used, then productivity is improved, but manufacturing precision deteriorates due to variations in liquid surface level

Engineering Contradiction:
Improveraw material supply efficiencyVSAvoidfilm thickness uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The liquid raw material is supplied periodically in multiple small amounts rather than continuously in one large amount. The supply is divided into multiple cycles where a predetermined amount is supplied, then the liquid surface level is checked, and supply is repeated if necessary. This periodic action maintains consistent liquid surface level and improves film thickness uniformity while still ensuring continuous material availability.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The liquid surface level is detected after each supply cycle and this information is fed back to control the supply process. The detection unit measures the liquid surface level, and based on this feedback, the control unit determines whether to repeat the supply process. This closed-loop feedback mechanism ensures precise control of liquid surface level and consistent film formation.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If liquid surface level is precisely controlled, then manufacturing precision is improved, but device complexity increases due to multiple supply cycles and detection

Engineering Contradiction:
Improveliquid surface level controlVSAvoidsupply control system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The supply control system is segmented into distinct functional modules: a supply unit that delivers predetermined amounts, a detection unit that measures liquid surface level, and a control unit that coordinates the operations. This segmentation allows each component to perform its specific function independently, simplifying the overall system design while achieving precise control through coordinated operation of these modular components.

Inventive Principle:
Principle #1Segmentation

3Manufacturing precision

If multiple supply cycles are implemented, then manufacturing precision is improved, but loss of time increases due to repeated detection and supply operations

Engineering Contradiction:
Improvefilm thickness consistencyVSAvoidsupply process cycle time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

A predetermined amount of liquid raw material is supplied in each cycle, which may be slightly more than the exact amount needed to reach the target liquid surface level. This partial/excessive action ensures that the liquid surface level reaches or exceeds the target level, eliminating the need for additional fine-tuning cycles and reducing overall process time while maintaining precision.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables precise control of the liquid surface level and raw material gas flow, thereby stabilizing film thickness and reducing variations in film formation processes.

Implementation Method 1

a heating unit that heats the liquid raw material stored in the raw material storage tank to generate a raw material gas

Methodology Applied
Scientific EffectEvaporation: Evaporation

Implementation Method 2

a gas inlet provided in the raw material storage tank and connected to a carrier gas supply that supplies a carrier gas to the raw material storage tank, the carrier gas carrying the raw material gas

Methodology Applied
Scientific EffectGas flow:

Data Source

PatentUS12344936B2Liquid raw material supplying method and gas supply apparatus
Publication Date: 2025.07.01 TOKYO ELECTRON LTD
  • US12344936B2 patent drawing
  • US12344936B2 patent drawing

AI summary

Provided is a method of supplying a liquid raw material to a gas supply device. The gas supply device includes: a storage tank that stores the liquid raw material; a heating unit that heats the liquid raw material to generate a raw material gas; a level detecting unit that detects a liquid surface level of the liquid raw material stored in the storage tank; a gas inlet and a gas outlet provided in the storage tank; and a raw material inlet provided in the storage tank. The method includes: determining whether the liquid surface level of the liquid raw material is equal to or lower than a supply target level; and repeating supply of a specified amount of liquid raw material to the storage tank a specified number of times when the liquid surface level of the liquid raw material is equal to or lower than the supply target level.