Substrate Treating Liquid Supply System Particle Control
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Solution Overview
Problem
The generation of particles in the liquid supply unit of substrate treating apparatuses leads to reduced filter lifespan and increased pressure loss, particularly due to high-temperature environments causing particle formation and accumulation in pipelines.
Innovation Solution
A substrate treating apparatus with a controlled liquid supply system that includes a circulation line with a first heater maintaining the liquid at a temperature where particles are not eluted, and a second heater near the nozzle to achieve the process temperature, with filters installed downstream of each heater to minimize particle generation and accumulation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the treatment liquid is heated to process temperature in the pipeline, then the substrate can be treated effectively, but particles are generated and accumulated in the pipeline and filter
Solution Approach 1:
The heating process is segmented into two distinct stages: a first heater heats the liquid to a preliminary temperature (e.g., 40-60°C) in the first circulation line, and a second heater near the nozzle heats it to the final process temperature (e.g., 70-90°C). This segmentation prevents prolonged high-temperature exposure in long pipelines, reducing particle generation while still achieving effective substrate treatment.
Solution Approach 2:
A circulation system with filters acts as an intermediary between the heating process and the substrate treatment. The circulation lines allow the liquid to be heated and filtered in a controlled manner before being supplied to the nozzle, preventing particle accumulation in the main supply line while maintaining treatment effectiveness.
2Stability of the object's composition
If the distance between heater and nozzle is increased, then the liquid can be heated more uniformly, but more particles are generated in the pipeline
Solution Approach 1:
The heating function is segmented between two heaters: the first heater provides preliminary heating over a longer distance for temperature uniformity, while the second heater provides final temperature adjustment near the nozzle. This segmentation allows temperature uniformity to be achieved without requiring excessive pipeline length, thus reducing particle generation.
Solution Approach 2:
The first heater performs preliminary heating and filtering of the liquid before it reaches the second heater and nozzle. This preliminary action removes particles at a lower temperature where fewer particles are generated, preventing accumulation before the liquid undergoes final heating near the substrate.
3Object-generated harmful factors
If a filter is installed in the supply line, then particles can be removed, but the filter lifespan is shortened due to continuous particle accumulation
Solution Approach 1:
The first filter in the first circulation line performs preliminary filtration at a lower temperature where fewer particles are generated. This preliminary filtering action removes particles before the liquid undergoes final heating, significantly reducing the particle load on the system and extending filter lifespan while maintaining effective particle removal.
Solution Approach 2:
The filtration system is segmented into multiple filters at different stages: the first filter handles preliminary filtration at lower temperature, and the system is designed to minimize particle generation in the second heating stage. This segmentation distributes the filtration load and extends overall system longevity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach minimizes particle generation, extends filter lifespan, and reduces pressure loss by maintaining the liquid at a standby temperature during circulation and heating it to a process temperature only when needed, ensuring efficient and effective substrate treatment.
Implementation Method 1
the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted
Implementation Method 2
the second heater heats the liquid to a second temperature, at which the liquid treats the substrate
Implementation Method 3
a first circulation line that circulates the liquid stored in the interior space
Implementation Method 4
A filter is provided in the supply line or the like to filter out the particles that float in the interior of the treatment liquid
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.