Liquid Toner Pattern Mask for High-Speed Substrate Patterning

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Solution Overview

Problem

Current lithography methods, such as optical and imprint lithography, face limitations in high-speed, high-volume production due to the need for photomasks or molds, and dry toner-based methods suffer from resolution issues and background printing problems.

Innovation Solution

A liquid toner-based pattern mask system using polymer-based liquid toner, which is deposited and fused on a substrate, allowing for high-speed processing and flexible patterning without the need for photomasks, and can be easily removed using a basic pH lift-off agent.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If inkjet-based liquid resist printing is used, then pattern mask can be applied directly without photomask or mold, but printing speed is relatively slow limiting high-volume production

Engineering Contradiction:
Improvedirect printing capabilityVSAvoidprinting speed
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The patent replaces the mechanical inkjet printing system with an electrostatic field-based liquid electrophotographic printing system. Liquid toner particles are charged and guided by electrostatic fields to the substrate, enabling much faster deposition speeds while maintaining direct printing capability without photomasks or molds.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent uses a liquid carrier system where charged toner particles are suspended and transported through a liquid medium under electrostatic influence. This liquid-based transport mechanism enables high-speed particle delivery to the substrate surface, overcoming the speed limitations of traditional inkjet methods.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Productivity

If laser printer with dry toner is used, then high-speed printing is achieved, but resolution and line edge fidelity are severely limited with background printing problems

Engineering Contradiction:
Improveprinting speedVSAvoidpattern resolution and line edge fidelity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent changes the physical state of the toner from dry powder to liquid suspension, and changes the deposition mechanism from thermal fusion to electrostatic attraction. This allows for better particle control, sharper edges, and higher resolution patterns while maintaining high printing speeds through electrostatic field guidance.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the thermal/mechanical dry toner fusion process with an electrostatic field-based liquid toner deposition process. The electrostatic guidance of charged liquid particles enables precise pattern formation with superior line edge fidelity and eliminates background printing issues.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If photolithography with photoresist is used, then pattern mask is formed with good fidelity, but process complexity increases due to need for photomask and multiple processing steps

Engineering Contradiction:
Improvepattern fidelityVSAvoidprocess steps and equipment
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the photomask component from the lithography process. By using direct electrostatic printing of liquid toner patterns onto the substrate, the complex photomask fabrication, alignment, and handling steps are removed while maintaining pattern fidelity through electrostatic field control.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The liquid toner pattern serves multiple functions: it acts as the pattern definition, the deposition medium, and the eventual etch mask. This multi-functionality consolidates what would otherwise require separate photomask, photoresist coating, and pattern transfer steps into a more integrated process.

Inventive Principle:
Principle #6Universality (Multi-functionality)

4Manufacturing precision

If imprint lithography with pattern mold is used, then pattern is mechanically imprinted with good resolution, but device complexity increases due to mold creation and handling

Engineering Contradiction:
Improvepattern resolutionVSAvoidmold fabrication and handling
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the physical pattern mold from the lithography process. Instead of mechanically imprinting through a mold, patterns are directly formed by electrostatic guidance of liquid toner particles, eliminating mold fabrication, handling, and alignment complexity while maintaining resolution through field control.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables high-speed, high-resolution substrate patterning with improved line edge fidelity and reduced background printing, suitable for flexible substrates and high-volume production, while allowing for dynamic mask configuration and easy removal.

Implementation Method 1

The liquid toner comprises a carrier liquid and toner particles dispersed in the carrier liquid

Methodology Applied
Scientific EffectDispersion: Dispersion (of waves)

Implementation Method 2

exposing the substrate to a lift-off solution having a basic pH such that a bond between the substrate and the pattern mask is broken

Methodology Applied
Scientific EffectChemical bond breaking: Chemical Bonding

Data Source

PatentUS8017293B2Liquid toner-based pattern mask method and system
Publication Date: 2011.09.13 HEWLETT PACKARD DEVELOPMENT COMPANY LP
  • US8017293B2 patent drawing
  • US8017293B2 patent drawing
  • US8017293B2 patent drawing

AI summary

A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a lift-off technique that breaks a bond between the surface of the substrate and the pattern mask.