Amorphous Lithium Borosilicate Deposition at Low Substrate Temperature
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Solution Overview
Problem
Current methods for preparing amorphous lithium borosilicate and doped lithium borosilicate compounds for use in thin film batteries require high temperatures, which is problematic for materials with low melting points like lithium, and result in reduced ionic conductivity and stability issues.
Innovation Solution
A vapour deposition method that uses a substrate temperature below 180°C, with a controlled flow rate of atomic oxygen to co-deposit lithium, boron, and silicon, forming amorphous lithium borosilicate or doped lithium borosilicate compounds with maintained ionic conductivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If high temperature processing is used to prepare amorphous lithium borosilicate, then the material can be formed, but the ionic conductivity decreases and stability issues occur
Solution Approach 1:
The patent changes the processing temperature parameter from conventional high temperatures to below 180°C, and adjusts the oxygen flow rate parameter to at least 8 × 10^-8 m³/s. These parameter changes enable the formation of amorphous lithium borosilicate with maintained ionic conductivity above 1 × 10^-7 S/cm, resolving the contradiction between temperature and reliability.
2Temperature
If high temperature processing is used to prepare amorphous lithium borosilicate, then the material can be formed, but stability and degradation risks worsen
Solution Approach 1:
The patent implements parameter changes by reducing the processing temperature to below 180°C and controlling the oxygen flow rate at least 8 × 10^-8 m³/s. This produces amorphous lithium borosilicate with improved stability and reduced degradation risks, directly resolving the contradiction between temperature and composition stability.
3Ease of manufacture
If conventional deposition methods are used, then material can be deposited, but the ionic conductivity is significantly reduced
Solution Approach 1:
The patent applies parameter changes by optimizing the oxygen flow rate to at least 8 × 10^-8 m³/s and processing temperature to below 180°C. This resolves the contradiction by achieving both ease of manufacture through conventional deposition processes and maintained ionic conductivity above 1 × 10^-7 S/cm.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the production of amorphous lithium borosilicate compounds with ionic conductivity above 1 × 10^-7 S/cm at lower temperatures, suitable for use in lithium-based batteries, enhancing stability and reducing degradation risks.
Implementation Method 1
A vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound
Implementation Method 2
delivering a flow of said lithium, said oxygen, said boron and said silicon, wherein the rate of flow of said oxygen is at least about 8 × 10^-8 m³/s
Data Source
Figure 1
Figure 2
Figure 3A~3B
AI summary
The present invention provides a vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising: providing a vapour source of each component element of the compound, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source of boron and a source of silicon, and, optionally, a source of at least one dopant element; providing a substrate at a temperature of less than about 180°C; delivering a flow of said lithium, said oxygen, said boron and said silicon, and, optionally, said dopant element, wherein the rate of flow of said oxygen is at least about 8 x 10-8 m3/s; and co-depositing the component elements from the vapour sources onto the substrate wherein the component elements react on the substrate to form the amorphous compound.