Lithography Electrode Structure Particle Repulsion
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Solution Overview
Problem
In lithography apparatuses, particles attached to substrates, originals, or transfer materials can cause pattern errors due to their weak attachment forces, which are easily separated by external stimuli like static electricity, airflow, or vibration, leading to potential contamination and errors in pattern formation.
Innovation Solution
A lithography apparatus with an electrode structure surrounding the substrate and original, powered by a supply of alternating voltage with different phases to multiple electrode groups, creating an electric field that repels particles from the boundary layer back into the main airflow, preventing their attachment to surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If particles are trapped by charging a part of the original as a trapping part, then particles can be collected, but the trapping part becomes a particle source that can separate and redistribute particles to substrates or originals
Solution Approach 1:
The invention extracts the harmful function of particle trapping from the original by introducing a separate peripheral member with electrode structure. Instead of charging part of the original to trap particles, the electrode structure on the peripheral member traps particles in the boundary layer, preventing them from reaching the original or substrate. This separates the particle control function from the pattern transfer function.
Solution Approach 2:
The electrode structure on the peripheral member acts as an intermediary between the airflow and the original/substrate. It intercepts particles in the boundary layer through electrostatic forces before they can attach to the original or substrate, preventing the harmful effect without interfering with the main pattern transfer process.
2Ease of operation
If particles attach to surfaces with weak attachment forces, then they can be easily separated by external stimuli, but this separation causes particles to be redistributed and attached to substrates or originals
Solution Approach 1:
The invention applies preliminary anti-action by using the electrode structure to exert electrostatic forces on particles in the boundary layer before they can attach to surfaces. By preventing attachment in the first place, the system eliminates the subsequent problem of particle separation and redistribution that would contaminate substrates or originals.
3Object-generated harmful factors
If an electrode structure with multiple electrode groups is used to control particles, then particle repulsion is improved, but the device complexity increases
Solution Approach 1:
The electrode structure is segmented into multiple electrode groups arranged on the peripheral member. Each electrode group can be controlled independently or collectively, allowing flexible particle control strategies. This segmentation enables effective particle management while distributing the complexity across modular components rather than requiring a monolithic complex structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively reduces the attachment and separation of particles from surfaces, thereby minimizing pattern transfer errors and maintaining cleanliness within the apparatus.
Implementation Method 1
an electrode structure arranged so as to surround a side surface of one of the substrate and the original; and a power supply configured to supply an alternating voltage to the electrode structure
Implementation Method 2
creating an electric field that repels particles from the boundary layer back into the main airflow
Implementation Method 3
the power supply supplies alternating voltages having different phases to the plurality of electrode groups
Implementation Method 4
A boundary layer exists between an airflow and the surfaces of members such as the substrate and the original
Data Source
AI summary
A lithography apparatus transfers a pattern of an original to a substrate. The apparatus includes an electrode structure arranged so as to surround a side surface of one of the substrate and the original, and a power supply configured to supply an alternating voltage to the electrode structure. The electrode structure includes a plurality of electrode groups electrically insulated from each other, each electrode group including a plurality of electrodes electrically connected to each other, and the power supply supplies alternating voltages having different phases to the plurality of electrode groups.