Lithographic Apparatus Vibration Compensation via Beam Power Control
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Solution Overview
Problem
Lithographic apparatuses face reduced throughput due to time-consuming scanning movements that cause vibrations, affecting the accuracy and quality of patterns projected onto substrates, leading to detrimental impacts on the exposure process.
Innovation Solution
A lithographic apparatus equipped with a vibration measurement system and a control apparatus that adjusts the radiation beam's power to compensate for relative vibrations between the patterning device and the substrate during exposure, ensuring pattern accuracy and quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If scanning movements are used to expose target portions, then the lithographic apparatus can process multiple substrates, but the scanning movements cause vibrations that deteriorate pattern accuracy
Solution Approach 1:
The system uses vibration measurement apparatus to detect vibrations in real-time during scanning movements, and the control apparatus adjusts radiation beam power based on these measurements to compensate for pattern accuracy degradation, maintaining precision while preserving throughput
Solution Approach 2:
The control apparatus dynamically changes the power parameter of the radiation beam based on measured vibration levels, adjusting exposure parameters to compensate for vibrations and maintain pattern accuracy during scanning operations
2Productivity
If scanning movements are performed to increase substrate processing, then throughput is improved, but time is lost due to the scanning process itself
Solution Approach 1:
The vibration measurement and compensation system operates continuously during scanning movements, allowing the lithographic apparatus to maintain productive scanning operations without interruption while compensating for their detrimental effects on pattern accuracy
3Manufacturing precision
If vibration measurement and compensation systems are added, then pattern accuracy is maintained, but device complexity increases
Solution Approach 1:
The vibration measurement apparatus acts as an intermediary between the scanning mechanism and the exposure system, providing vibration data that the control apparatus uses to adjust radiation beam power, thereby maintaining pattern accuracy without requiring fundamental changes to the scanning system
Data Source
AI summary
A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.