Lithographic Clamp Thermal Insulation and Fluid Channels
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Solution Overview
Problem
Lithographic apparatuses using extreme ultraviolet (EUV) radiation face challenges with unwanted infrared (IR) and deep ultraviolet (DUV) radiation causing heat damage and deformation issues due to the absorption of non-EUV radiation, which existing technologies struggle to mitigate effectively.
Innovation Solution
A clamp system with thermally insulated voids and fluid channels is employed to control the temperature of objects within the lithographic apparatus, using a fluid conditioning device to adjust the temperature of the fluid passing through channels to maintain the object at a zero-crossing temperature, thereby minimizing internal thermal forces and deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a clamp system with fluid channels is used to control temperature, then temperature control capability is improved, but device complexity increases
Solution Approach 1:
The clamp is divided into multiple segments with individual fluid channels, allowing independent temperature control of different regions. This segmentation enables precise local temperature management while keeping each channel relatively simple in design.
Solution Approach 2:
The clamp structure serves multiple functions: it provides mechanical clamping force, acts as a thermal management system through integrated fluid channels, and offers structural support. This multi-functionality reduces the need for separate components, thereby managing complexity.
2Temperature
If voids are introduced for thermal insulation, then thermal insulation performance is improved, but device complexity increases
Solution Approach 1:
The voids are nested within the clamp structure, with insulating material placed inside the clamp body. This nesting approach provides effective thermal insulation while utilizing the existing clamp geometry, avoiding the need for separate insulation components.
Solution Approach 2:
Thermal insulation is applied locally at specific regions where heat transfer needs to be controlled, rather than uniformly throughout the entire structure. This localized approach optimizes insulation performance where needed while minimizing added complexity.
3Object-affected harmful factors
If spectral purity filters are used to remove non-EUV radiation, then radiation quality is improved, but device complexity increases
Solution Approach 1:
Spectral purity filters are introduced as intermediary components in the radiation path to selectively remove non-EUV radiation. These filters act as mediators between the radiation source and the workpiece, improving radiation quality without requiring fundamental changes to the source or processing system.
4Temperature
If cooling fluid is circulated through the clamp, then temperature regulation is improved, but device complexity increases
Solution Approach 1:
A fluid circulation system is implemented using hydraulic or pneumatic principles, where cooling fluid is pumped through channels in the clamp. This approach provides effective temperature regulation through established fluid dynamics mechanisms while using conventional, well-understood system components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces deformation and overlay errors by maintaining the object at a zero-crossing temperature, ensuring precise temperature control and minimizing thermal stress, thus enhancing the accuracy and stability of the lithographic process.
Implementation Method 1
The chuck defines at least one void configured to thermally insulate the chuck from the clamp
Implementation Method 2
a fluid conditioning device to adjust the temperature of the fluid passing through channels to maintain the object at a zero-crossing temperature
Data Source
AI summary
A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.


