Lithographic Component Cooling via Gas Flow Restriction

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Solution Overview

Problem

Lithographic apparatus components face undesirable heat loads, leading to local deformation and imaging errors due to temperature variations and inefficient cooling systems that either fail to reach set point temperatures or affect adjacent components.

Innovation Solution

A local cooling system using a gas passageway with a flow restriction to direct cooled gas and apply a controlled cooling load to components, leveraging the Joule-Thomson effect for efficient temperature regulation and re-use of coolant gas.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If liquid cooling systems are used to remove heat from components, then cooling efficiency is improved, but thermal inertia and risk of leakage increase

Engineering Contradiction:
Improvecomponent temperature controlVSAvoidleakage risk
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent replaces liquid cooling systems with a gas-based cooling system using helium or nitrogen. The gas flows through channels in the component carrier, absorbing heat from components without the leakage risks associated with liquids. The system uses pressure control and flow regulation to maintain effective cooling while eliminating contamination concerns.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Temperature

If cooling medium temperature is lowered to reach set point temperature, then cooling effectiveness is improved, but adjacent components are adversely affected

Engineering Contradiction:
Improveset point temperature achievementVSAvoidthermal impact on adjacent components
Core Design Contradiction:
TemperatureVSObject-affected harmful factors

Solution Approach 1:

The patent implements localized cooling zones with independent temperature control for different regions of the component carrier. Each cooling channel can be regulated separately, allowing precise temperature management at specific locations without over-cooling adjacent areas. This enables achieving set point temperatures for heat-generating components while maintaining appropriate temperatures for neighboring components.

Inventive Principle:
Principle #3Local quality

3Temperature

If conventional cooling systems are used, then cooling capacity is sufficient, but system complexity and thermal inertia increase

Engineering Contradiction:
Improvecooling capacityVSAvoidcooling system complexity
Core Design Contradiction:
TemperatureVSDevice complexity

Solution Approach 1:

The patent employs passive cooling features where the component carrier structure itself serves as the cooling pathway. Heat is conducted directly from components through the carrier material to cooling channels, eliminating the need for active pumping systems and complex thermal management infrastructure. The system uses natural convection and conduction to achieve effective cooling with minimal mechanical components.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system effectively maintains components at or near set point temperatures, reducing imaging errors and allowing for flexible cooling control without the thermal inertia of liquid-based systems, while minimizing the risk of liquid leakage and contamination.

Implementation Method 1

A local cooling system uses a gas passageway with a flow restriction to direct cooled gas and apply a controlled cooling load to components, leveraging the Joule-Thomson effect for efficient temperature regulation

Methodology Applied
Scientific EffectJoule-Thomson effect: Joule-Thomson Effect

Data Source

PatentUS9811007B2Lithographic apparatus and method of cooling a component in a lithographic apparatus
Publication Date: 2017.11.07 ASML NETHERLANDS BV
  • US9811007B2 patent drawing
  • US9811007B2 patent drawing
  • US9811007B2 patent drawing

AI summary

A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.